Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

ZEMAX simulation method for laser tracking system based on dual-wavelength method for compensating air refractive index

A technology for compensating air and laser tracking, applied in design optimization/simulation, using optical devices, special data processing applications, etc., can solve the problem that the measurement accuracy affects the measurement accuracy of air refractive index, the sensor accuracy is insufficient, and the laser tracking measurement accuracy is difficult to further improve and other problems to achieve the effect of model optimization

Active Publication Date: 2018-11-30
BEIJING UNIV OF TECH
View PDF8 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The measurement accuracy of the sensor directly affects the measurement accuracy of the air refractive index, and the sensor has the problem of insufficient accuracy, which makes it difficult to further improve the accuracy of laser tracking measurement

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • ZEMAX simulation method for laser tracking system based on dual-wavelength method for compensating air refractive index
  • ZEMAX simulation method for laser tracking system based on dual-wavelength method for compensating air refractive index
  • ZEMAX simulation method for laser tracking system based on dual-wavelength method for compensating air refractive index

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0046] The present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments. image 3 It is a flow chart of system simulation using ZEMAX software, and its specific implementation process and result analysis process are as follows:

[0047] Step 1: Set the optical system parameters for laser tracking measurement, namely wavelength and aperture. According to the system requirements, the wavelengths are respectively selected as 532nm and 1064nm, and the aperture is selected as 20mm.

[0048] Step 2: Use the Jones matrix to analyze the first polarizer P 1 and the second analyzer P 2 Do a simulation. P 1 and P 2 The relationship between the incident light and the transmitted light is expressed in a matrix as follows:

[0049]

[0050] Among them: A 1 , B 1 , A 2 , B 2 Indicates that the incident light vector and the outgoing light vector are in figure 2 The corresponding two components on the x-axis a...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a ZEMAX simulation method for a laser tracking system based on a dual-wavelength method for compensating an air refractive index, and is used for analyzing the influence of non-ideality of each optical element in an optical system on system energy; based on an optical system principle of the laser tracking measurement system that compensates the air refractive index based on the dual-wavelength method, according to structures between various optical elements, parameters of multiple structures are set, then the parameters are sequentially adjusted, and a model of the laser tracking measurement system based on the double-wavelength method for compensating the air refractive index is established. Parameters of various optical elements are set, the interference signal stripe contrast is analyzed, the optimal parameter setting of the optical system is achieved, and the purpose of improving the measurement precision of the laser tracking measurement system is achieved, thus the ZEMAX simulation method provided by the invention has guiding significance for the design of the laser tracking measurement optical system and the selection of the optical elements.

Description

technical field [0001] The invention relates to a ZEMAX simulation method, in particular to a ZEMAX simulation method for a laser tracking measurement system based on a dual-wavelength method for compensating air refractive index, and belongs to the field of precision measurement. Background technique [0002] Laser tracker is a high-precision measuring instrument in the field of industrial measurement. It uses high-resolution laser interferometry to achieve high-precision measurement. It is widely used in aviation, aerospace, ships, automobiles and other fields. The refractive index of air is an important parameter that affects the accuracy of laser interferometry, especially in large-scale measurements. The key to improving the accuracy of laser tracking measurement is to compensate the air refractive index of the system. At present, the compensation of air refractive index has been in the bottleneck stage in the high-precision laser tracking measurement system. [0003]...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G01B11/00G06F17/50
CPCG01B11/00G06F30/20
Inventor 陈洪芳汤亮石照耀戴成睿宋辉旭孙衍强
Owner BEIJING UNIV OF TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com