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Device and method for manufacturing target materials through centrifugal sintering

A target and mold technology, which is used in the field of centrifugal sintering devices for manufacturing targets, can solve the problems of extremely high processing accuracy, difficult to guarantee product yield, and difficult scrap recycling, so as to reduce equipment costs and achieve continuous automation. The effect of production and saving of raw materials

Pending Publication Date: 2018-12-04
FUJIAN ACETRON NEW MATERIALS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] 1. There is a lot of waste of materials. Since the target material has extremely high requirements on purity, it is difficult to recycle scraps and the cost is high;
[0005] 2. The process is cumbersome, the production cycle is long and the efficiency is low;
[0006] 3. The processing precision is extremely high, and the product yield is difficult to guarantee

Method used

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  • Device and method for manufacturing target materials through centrifugal sintering
  • Device and method for manufacturing target materials through centrifugal sintering
  • Device and method for manufacturing target materials through centrifugal sintering

Examples

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preparation example Construction

[0046] In the present invention, the preparation method of the target slurry preferably includes the following steps:

[0047] The target raw material with a medium particle size of 50±5 μm is ball milled for 6-10 hours under the condition of a ball-to-water mass ratio of (1.6-2.0):1:(0.50-0.55) and a rotational speed of 50-700rpm to obtain a target slurry .

[0048] The present invention preferably selects the composition of the target raw material according to actual needs, specifically, when preparing Nb 2 o x (x=4.6~4.8) target material, in terms of parts by mass, the present invention preferably adopts 90~99 parts of Nb 2 o 5 powder and 1 to 10 parts of Nb powder as target raw materials; when preparing an AZO target, the present invention preferably uses 90 to 99 parts of ZnO powder and 1 to 10 parts of Al 2 o 3 powder as the target material; when preparing TiO x (x=1.8~1.9) target material, in terms of parts by mass, the present invention preferably adopts 90~99 pa...

Embodiment 1

[0054] Preparation of Nb 2 o x (x=4.6~4.8) ceramic tube target material, including the following steps:

[0055] Take 97.5 parts of Nb with a particle size of 52 μm 2 o 5 Powder and 2.5 parts of Nb powder with a particle size of 50 μm were ball-milled for 6 hours at a ball-to-water mass ratio of 1.6:1:0.5 and a rotational speed of 700 rpm to obtain a target material slurry; wherein, the ball mill used in the ball milling process The ball is an alumina ball with an average particle size of 3mm;

[0056] Place the target slurry in high-strength porous Al 2 o 3 In the mould, start the high-speed motor (rotating speed is 12000rpm) and the resistance heating sleeve, and the high-speed motor drives the rotating base to rotate, so that the high-strength porous Al 2 o 3 The target slurry in the mold is bonded to the high-strength porous Al 2 o 3 The surface of the mold is heated by a resistance heating jacket to fire the target slurry attached to the surface of the mold (at 1...

Embodiment 2

[0061] Preparation of AZO ceramic tube target includes the following steps:

[0062] Take 98 parts of ZnO powder with a particle size of 49 μm and 2 parts of Al with a particle size of 50 μm 2 o 3 Powder, ball milled for 8 hours under the condition of ball-to-water mass ratio of 1.8:1:0.55 and rotating speed of 500rpm to obtain target material slurry; wherein, the ball milling balls used in the ball milling process are alumina balls with an average particle size of 8mm ;

[0063] Place the target slurry in high-strength porous Al 2 o 3 In the mould, start the high-speed motor (rotating speed is 18000rpm) and the resistance heating sleeve, and the high-speed motor drives the rotating base to rotate, so that the high-strength porous Al 2 o 3 The target slurry in the mold is bonded to the high-strength porous Al 2 o 3 The surface of the mold is heated by a resistance heating jacket to fire the target slurry attached to the surface of the mold (at 800°C for 6h), turn off th...

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Abstract

The invention discloses a device for manufacturing target materials through centrifugal sintering. The device comprises an outer shell, a resistance heating sleeve, a die and a driving motor, whereinthe resistance heating sleeve, the die and the driving motor are arranged inside the outer shell. The die is arranged in a heating cavity inside the resistance heating sleeve, the bottom of the die isprovided with a rotary base, the driving motor is arranged at the bottom of the outer shell, a rotating shaft of the driving motor is connected with the rotary base, the head end of the outer shell is of an opening-closing door structure, and the heating cavity can be opened and closed through the opening-closing door. According to the device for manufacturing the target materials through centrifugal sintering, the high-density target materials can be manufactured, raw materials are saved, the hole digging work procedure is omitted, the yield is improved, and the cost is greatly reduced.

Description

technical field [0001] The invention relates to the technical field of manufacturing a rotating target, in particular to a device and method for manufacturing a target by centrifugal sintering. Background technique [0002] With the rapid development of the global electronic information industry, the demand for smart phones, tablet computers, automotive electronics and other terminal consumption fields continues to grow, and the use of thin film materials is becoming more and more frequent. The annual compound growth rate of domestic high-purity targets continues to grow, which means It provides a broad development space for the domestic sputtering target industry. [0003] At present, targets can be divided into rotating targets and planar targets according to their shape and appearance. In the classification of rotating targets, rotating targets such as ITO and AZO are bound to stainless steel or Titanium back tube. And in the existing raw material pipe production, mainl...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): F27B14/06F27B14/08C04B35/64C04B35/453C04B35/46C04B35/457C04B35/495
CPCF27B14/06F27B14/08C04B35/453C04B35/457C04B35/46C04B35/495C04B35/64C04B2235/404C04B2235/3217
Inventor 陈钦忠陈宝忠林志河蔡小勇邱树将
Owner FUJIAN ACETRON NEW MATERIALS CO LTD