Large-size thermal field rapid temperature stabilizing process for pulling of crystals

Abstract

The invention provides a large-size thermal field rapid temperature stabilizing process for pulling of crystals. The process comprises the following steps: calibrating the liquid surface temperature of a silicon solution; step 2, collecting initial seeding power data of multi-furnace single crystals; and step 3, setting a supercooling temperature and carrying out fine tuning on temperature throughclosed-loop control. The invention has the following beneficial effects: since the above technical scheme is adopted for temperature adjustment in the procedure of temperature stabilizing and programming is carried out, automatic temperature stabilization is realized, operation time of temperature stabilization is reduced, requirements on the operation skills of crystal pulling are lowered, and one worker is allowed to take care of a plurality of single crystal furnaces at ease.

Description

technical field [0001] The invention belongs to the technical field of single crystal silicon production, and in particular relates to a process method for rapidly stabilizing the temperature of a Czochralski single crystal large-size thermal field. Background technique [0002] The single crystal growth process includes steps such as dismantling, melting, temperature stabilization, seeding, shoulder expansion, shoulder rotation, equal diameter, finishing, and furnace shutdown. The current technology and equipment in the photovoltaic industry are developing rapidly, and the mainstream thermal field sizes are 26 / 28 / 30 / 32. The characteristics of these large-scale thermal fields are relatively large thermal inertia and long temperature stabilization time, resulting in waste of working hours, limited production capacity, and manual operation. When the temperature is stable, the requirements for crystal pulling operation skills are relatively high. At present, the industry is de...

AI Technical Summary

Problems solved by technology

The current technology and equipment in the photovoltaic industry are developing rapidly, and the mainstream thermal field sizes are 26 / 28 / 30 / 32. The characteristics of these large-scale thermal fields are relatively large thermal inertia and long temperature stabilization time, resulting in waste of working hours, limited production capacity, and manual operation. When the temperature is stable, the requirements for crystal pulling operation skills are relatively high

At present, the industry is developing rapidly, and skilled crystal pulling operations are relatively scarce.

Images