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Hydrogen-containing polysiloxane photoinitiator terminated by photoinitiating group and preparation method thereof

A technology of hydrogen polysiloxane and photoinitiator, which is applied in the field of single-component polysiloxane photoinitiator, and can solve problems such as poor control of silicon hydrogen content

Active Publication Date: 2021-04-16
WUHAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In this structure, the photoinitiating group is located in the side group, and it is prepared by the silicon hydrogen addition method. The silicon hydrogen content is not easy to control during the preparation process. If the control is not good, it is easy to form dehydrogenation and form a crosslinked structure. After the reaction is completed, some unreacted parts will remain. Small photoinitiator molecules will cause problems such as residue, migration and toxicity, which will affect the use in some special cases

Method used

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  • Hydrogen-containing polysiloxane photoinitiator terminated by photoinitiating group and preparation method thereof
  • Hydrogen-containing polysiloxane photoinitiator terminated by photoinitiating group and preparation method thereof
  • Hydrogen-containing polysiloxane photoinitiator terminated by photoinitiating group and preparation method thereof

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0044]

[0045] Preparation:

[0046] 1,1,3,3,5,5,7,7-octamethylcyclotetrasiloxane D 4 (1.2g, 4mmol), 1,3,5,7-tetramethylcyclotetrasiloxane D 4 H(0.05g, 0.21mmol), a mixture of anhydrous strongly acidic styrene-based cation exchange resin (Langfang Nanda Resin Co., Ltd.) (0.09g) and anhydrous toluene 5mL, after heating at 110°C for 5h, stop the reaction, and cool naturally After reaching room temperature, the reaction solution was filtered to remove the cation exchange resin, and low boilers were extracted under reduced pressure at 120°C to obtain 1.60 g of a yellow viscous liquid.

[0047] 1 H NMR (400MHz, CDCl 3 )δ(ppm)8.68–8.54(m,Ar-H),8.45-8.40(m,Ar-H),8.38-8.32(m,Ar-H),7.75–7.57(m,Ar-H),7.16 (t,Ar-H),4.69-4.55(m,Si-H),4.15-3.99(m,NCH 2 -),3.21(s,N(CH 2 CH 2 CH) 2 ),1.88(d,N(CH 2 CH 2 CH) 2 ),1.74-1.68(m,N(CH 2 CH 2 CH) 2 , Si-CH 2 CH 2 -),0.76–0.55(m, Si-CH 2 ),0.28–-0.04(m, Si-CH 3 );FT-IR(film,cm -1 ): ν=2162 (Si-H), 1697, 1659 (C=O), 1260 (Si-C...

Embodiment 2

[0051]

[0052] Preparation:

[0053] 1,3,5,7-Tetramethylcyclotetrasiloxane D 4 H (0.40g, 1.7mmol), a mixture of anhydrous strongly acidic styrene-based cation exchange resin (Langfang Nanda Resin Co., Ltd.) (0.2g) and 25mL of 1,2-dichloroethane, heated at 80°C for about 30h, Stop the reaction and cool down to room temperature naturally, filter the reaction solution to remove the cation exchange resin, and extract the low boilers under reduced pressure at 120°C to obtain 5.2 g of yellow viscous liquid.

[0054] 1 H NMR (400MHz, CDCl 3 )δ(ppm)8.68–8.54(m,Ar-H),8.45-8.40(m,Ar-H),8.38-8.32(m,Ar-H),7.75–7.57(m,Ar-H),7.16 (t,Ar-H),4.69-4.55(m,Si-H),4.15-3.99(m,NCH 2 -),3.21(s,N(CH 2 CH 2 CH) 2 ),1.88(d,N(CH 2 CH 2 CH) 2 ),1.74-1.68(m,N(CH 2 CH 2 CH) 2 , Si-CH 2 CH 2 -),0.76-0.55(m, Si-CH 2 ),0.28–-0.04(m, Si-CH 3 );FT-IR(film,cm -1 ): ν=2162 (Si-H), 1697, 1659 (C=O), 1260 (Si-CH 3 ), 1220-980 (Si-O-Si), 801 (Si-CH 3 ).

[0055] UV maximum absorption peak:...

Embodiment 3

[0058]

[0059] Preparation:

[0060] 1,3,5,7-Tetramethylcyclotetrasiloxane D 4 H (0.3g, 1.24mmol), a mixture of anhydrous strongly acidic styrene-based cation exchange resin (Langfang Nanda Resin Co., Ltd.) (0.06g) and anhydrous toluene 5mL, heated at 80°C for about 25h, then stopped the reaction and cooled naturally to At room temperature, the reaction solution was filtered to remove the cation exchange resin, and low boilers were extracted under reduced pressure at 140°C to obtain 0.75 g of a yellow viscous liquid.

[0061] 1 H NMR (400MHz, CDCl 3 )δ(ppm)8.68–8.54(m,Ar-H),8.45-8.40(m,Ar-H),8.38-8.32(m,Ar-H),7.75–7.57(m,Ar-H),7.16 (t,Ar-H),4.69-4.55(m,Si-H),4.15-3.99(m,NCH 2 -),3.21(s,N(CH 2 CH 2 CH) 2 ),1.88(d,N(CH 2 CH 2 CH) 2 ),1.74-1.68(m,N(CH 2 CH 2 CH) 2 , Si-CH 2 CH 2 -),0.76-0.55(m, Si-CH 2 ),0.28–-0.04(m, Si-CH 3 );FT-IR(film,cm -1 ): ν=2162 (Si-H), 1697, 1659 (C=O), 1260 (Si-CH 3 ), 1220-980 (Si-O-Si), 801 (Si-CH 3 ).

[0062] UV maximum ...

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Abstract

The invention discloses a hydrogen-containing polysiloxane photoinitiator blocked by a photoinitiating group. The photoinitiator has an excellent ability to overcome oxygen polymerization inhibition. The photoinitiator has a structure in which 0≤x<1,0

Description

technical field [0001] The invention relates to the field of photoinitiators, in particular to a single-component polysiloxane photoinitiator capable of overcoming oxygen inhibition. Background technique [0002] Photopolymerization technology is widely used in many fields such as photocurable coatings, adhesives, inks, microelectronics, and photoresists. Among them, free radical photocuring system is currently the most widely used photocuring technology. [0003] In the free radical photocuring system, free O 2 Two unpaired electrons with the same spin direction can compete with the polymerization reaction of free radicals to consume free radicals. This phenomenon is called oxygen inhibition. Oxygen inhibition is a phenomenon in which a large number of oxidative structures such as hydroxyl, carbonyl, and peroxyl are produced on the surface of the coating during the air photocuring process, so that the bottom layer of the coating is cured and the surface is not cured. In ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C08G77/28C08G77/26C08G77/12C08G77/14C08F2/48
CPCC08F2/48C08G77/12C08G77/14C08G77/26C08G77/28
Inventor 唐红定杨建静项学驰
Owner WUHAN UNIV
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