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A method for determining the position of a baffle of an exposure machine

A determination method and exposure machine technology, which is applied in the direction of photolithography exposure equipment, microlithography exposure equipment, etc., can solve the problems of long inspection time, low efficiency and production capacity, and large number of confirmation graphics, so as to improve production capacity and improve Check efficiency, effect of reducing pageviews

Active Publication Date: 2019-01-15
昆山仪电显示材料有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In practice, the larger the photoresist area, the more subdivided areas, and the more exposure times, resulting in a greater number of page views for confirmation graphics, longer inspection time, and lower efficiency and productivity.

Method used

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  • A method for determining the position of a baffle of an exposure machine
  • A method for determining the position of a baffle of an exposure machine
  • A method for determining the position of a baffle of an exposure machine

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Embodiment Construction

[0041] In order to make the above objects, features and beneficial effects of the present invention more comprehensible, specific embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0042] figure 1 It is a structural schematic diagram of the exposure process of the exposure machine in an embodiment of the present invention; figure 2 yes figure 1 The top view of the mask plate and substrate in ; image 3 yes figure 2 An exposure result of the film layer to be exposed on the middle substrate.

[0043] First refer to figure 1 As shown, the exposure machine needs to use the baffle plate 1 to shield the areas on the substrate 2 that do not need to be exposed during the exposure process.

[0044] The method for determining the position of the baffle 1 includes the following steps, which will be introduced respectively below.

[0045] First, combine figure 1 and figure 2 As shown, the film layer 20 to be exp...

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Abstract

The invention discloses a baffle position determination method of an exposure machine. By changing the position of a baffle position confirmation pattern, the baffle position confirmation pattern is arranged near a common boundary of two exposure sub-regions, so that the boundary of two sub-exposure regions can be inspected simultaneously in a baffle position confirmation pattern inspection process. Compared with the method of checking the boundary of one sub-exposure area at a time, the invention can improve the checking efficiency, reduce the browsing quantity of the confirmation pattern, and can shorten the checking time and improve the production capacity.

Description

technical field [0001] The present invention relates to the technical field of exposure equipment, in particular to a method for determining the position of a baffle of an exposure machine. Background technique [0002] In recent years, with the rapid development of the information and communication field, the requirements for various types of display devices are increasing. Among them, the liquid crystal display panel (LCD) has gradually developed into a mainstream display device due to its lightness, thinness, small size, low power consumption, and low radiation. Taking the liquid crystal driving mode as TN (Twisted Nematic) as an example, the liquid crystal display panel generally includes: a color filter substrate, a thin film transistor substrate and a liquid crystal between them. Wherein, the color filter substrate mainly includes: a glass substrate, a black matrix layer located on the glass substrate, a color filter layer located on the glass substrate not covered by...

Claims

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Application Information

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IPC IPC(8): G03F7/20
CPCG03F7/20
Inventor 唐文静范刚洪徐广军王群
Owner 昆山仪电显示材料有限公司