Avalanche photodetector based on arc-shaped diffusion region and its manufacturing method
An avalanche photoelectric and diffusion area technology, applied in circuits, electrical components, semiconductor devices, etc., can solve the problems of reduced detection efficiency of single-photon detectors, increased detection efficiency of devices, and decreased overall device performance, so as to improve photon detection efficiency, Reduce the probability of post-pulse and reduce the effect of edge electric field
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[0032] The disclosure provides an avalanche photodetector based on an arc-shaped diffusion region and its manufacturing method. By forming a 3D bowl-shaped opening in the intrinsic multiplication layer and performing high P-type doping in the bowl-shaped opening, the center of the window The partially undiffused multiplication layer has the smallest thickness, and the edge thickness is the largest, so as to form a P-type highly doped arc-shaped diffusion region, so that the central part of the light field in the multiplication region of the avalanche detector has the strongest gain, and the impact ionization of the multiplication region is more uniform in the lateral direction , reduce the edge electric field and the resulting edge breakdown, and ensure the spatial coincidence of the center light field and the strongest electric field of the device, which can effectively improve the photon detection efficiency of the device, reduce the dark count of the device, and reduce the po...
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