The invention discloses an avalanche
photodetector based on an arc
diffusion region and a manufacturing method of the avalanche
photodetector. The avalanche
photodetector comprises an epitaxial structure, a
passivation layer, a P type
electrode layer, an N type
electrode layer, and an antireflection film, wherein the epitaxial structure comprises an N-type substrate, an
absorption layer, a chargelayer and an intrinsic multiplication layer from the bottom up; a 3D bowl-shaped opening is formed in the intrinsic multiplication layer, and a P-type highly-doped arc-shaped
diffusion region is formed under the 3D bowl-shaped opening; the
passivation layer formed on the epitaxial structure; the P-type
electrode layer is in contact with the P-type highly-doped arc-shaped
diffusion region; the N-type electrode layer is in contact with the N-type substrate; the antireflection film, which serves as a light window, is arranged on the front surface or the back surface of the single-
electron avalanche photodetector; the connecting line of the center of the antireflection film and the curvature center of the arc-shaped diffusion area is parallel to the extension direction; and the
light field central area of the light window coincides with a
high field area in space. According to the avalanche photodetector, the
photon detection efficiency of the device is effectively improved, the dark countof the device is reduced, and the probability of the post pulse is reduced.