The invention discloses an avalanche 
photodetector based on an arc 
diffusion region and a manufacturing method of the avalanche 
photodetector. The avalanche 
photodetector comprises an epitaxial structure, a 
passivation layer, a P type 
electrode layer, an N type 
electrode layer, and an antireflection film, wherein the epitaxial structure comprises an N-type substrate, an 
absorption layer, a chargelayer and an intrinsic multiplication layer from the bottom up; a 3D bowl-shaped opening is formed in the intrinsic multiplication layer, and a P-type highly-doped arc-shaped 
diffusion region is formed under the 3D bowl-shaped opening; the 
passivation layer formed on the epitaxial structure; the P-type 
electrode layer is in contact with the P-type highly-doped arc-shaped 
diffusion region; the N-type electrode layer is in contact with the N-type substrate; the antireflection film, which serves as a light window, is arranged on the front surface or the back surface of the single-
electron avalanche photodetector; the connecting line of the center of the antireflection film and the curvature center of the arc-shaped diffusion area is parallel to the extension direction; and the 
light field central area of the light window coincides with a 
high field area in space. According to the avalanche photodetector, the 
photon detection efficiency of the device is effectively improved, the dark countof the device is reduced, and the probability of the post pulse is reduced.