Motion control method for workpiece table of lithography machine

A technology of motion control and workpiece table, applied in the direction of electric controllers, controllers with specific characteristics, etc., can solve the problems that affect the machining accuracy of feed motion trajectory and cannot eliminate the steady-state tracking error, so as to overcome the steady-state position tracking error, improving dynamic performance and positioning accuracy, and the effect of flexible methods

Inactive Publication Date: 2019-02-19
UNIV OF ELECTRONICS SCI & TECH OF CHINA
View PDF4 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Aiming at the above-mentioned deficiencies in the prior art, the present invention provides a motion control method for the workpiece table of a lithography machine, which solves the problem that the traditional PID control method for the workpiece table of a lithography machine cannot eliminate or reduce the steady-state tracking error, thereby affecting The machining accuracy of the feed motion trajectory, and the problem that the output trajectory and speed of the system cannot reproduce the planned trajectory and planned speed to the greatest extent at any time

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Motion control method for workpiece table of lithography machine
  • Motion control method for workpiece table of lithography machine
  • Motion control method for workpiece table of lithography machine

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0057] Such as figure 1 As shown, the present invention provides a method for controlling the motion of a lithography machine workpiece table, the method comprising the following steps:

[0058] (S1) Setting the motion servo system of the workpiece table of the lithography machine into a three-loop PID control structure;

[0059] (S2) Introducing double feedforward in the three-loop PID control structure to realize the control of the motion servo system.

[0060] In this embodiment, the method adopts a double feedforward plus three-loop PID control structure, which is composed of current loop PID, speed loop PID, position loop PID, speed feedforward and acceleration feedforward, wherein the current loop PID , used to adjust the deviation response of the speed and position of the motion servo system; the speed loop PID is used to perform PID control on the speed deviation of the current loop PID; the position loop PID is used to control the current loop PID PID control of the...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides a motion control method for the workpiece table of a lithography machine, comprising the following steps: (S1) setting the motion servo system of the lithography machine workpiece table into a three-ring PID control structure; (S2) introducing a dual feedforward in the three-loop PID control structure to achieve control of the motion servo system. According to the motion control method for workpiece table of lithography machine, the design and modeling difficulty of the motion servo system are reduced, the model uncertainty caused by the disturbance is tracked, and the steady-state tracking error is reduced, which improve the positioning and tracking accuracy. The invention not only ensures the stability and corresponding rapidity of the motion servo system, but alsomakes the output trajectory and speed of the motion servo system reproduce the planning trajectory and the planning speed to the maximum extent at any time. The method of the invention is flexible, prone to control, and is strong in promotion value and practical value.

Description

technical field [0001] The invention relates to the field of precision motion control, in particular to a method for controlling the motion of a workpiece table of a lithography machine. Background technique [0002] A lithography machine is a device for manufacturing large-scale integrated circuits. The workpiece table is a key component of a lithography machine. played an important role in the filming process. In lithography machine control, in order to solve the problem that a single type of actuator control method cannot solve the contradiction between high precision and large stroke, macro-micro structure is usually used in the lithography machine system, in which the macro-moving stage completes high-speed, long-stroke Movement, the movement of the macro-motion part is realized by a linear motor, and the micro-motion part mainly uses a voice coil motor to realize ultra-precise dynamic tracking and positioning. The speed has a direct impact on the resolution and produ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G05B11/42
CPCG05B11/42
Inventor 张泽州邹见效彭超张健牛凡徐红兵
Owner UNIV OF ELECTRONICS SCI & TECH OF CHINA
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap