Direct-writing lithography device position synchronizing method and system

Abstract

The invention discloses a direct-writing lithography device position synchronizing method and system and belongs to the technical field of lithography equipment. The direct-writing lithography deviceposition synchronizing method comprises, through an FPGA (field programmable gate array) processor arranged inside a DMD (digital micromirror display), synchronizing the image output of the DMD unit and the position of a motion platform, and specifically includes the following steps that the FPGA processor detects single-ended signals, which are obtained by converting position synchronizing signals output by the driver of the motion platform; when the single-ended signals are detected, a clock signal output from the inside of the FPGA processor is triggered; the clock signal triggers and outputs scanning data between the DMD and the motion platform. According to the direct-writing lithography device position synchronizing method and system, the position synchronizing signals serve as signals for indicating whether the motion platform reaches a designated exposure position, dependence on PSO (particle swarm optimization) signals output by the driver of the motion platform can be reduced, and incontinuity of image exposure caused by loss of the PSO signals of the driver of the motion platform can be avoided.

Description

technical field [0001] The present invention relates to the technical field of lithography equipment, in particular to a position synchronization method and system for direct writing lithography equipment. Background technique [0002] Laser write-only lithography equipment is a key equipment used in the production and processing of semiconductors and precision PCBs. The current lithography equipment mainly uses scanning exposure to improve the production capacity of the lithography machine. In scanning exposure, DMD digital micromirror The position synchronization between the image output and the motion platform is a key factor, such as figure 1 As shown, in the current equipment, the position synchronization signal output by the driver of the precision motion platform is directly used as the trigger signal output by the DMD equipment. [0003] The matching process between the movement of the precision platform and the output of DMD exposure graphics is generally as follow...

AI Technical Summary

Problems solved by technology

[0005] (1) When the PSO signal triggered by the platform driver is lost due to the platform itself or the external environment (electromagnetic interference, temperature and humidity, etc.) interference, it will seriously affect the graphics accuracy of the graphics on the photosensitive element, and graphics output may occur The discontinuity, breakage occurs

[0006] (2) Due to the resolution of the platform driver itself, the minimum resolution of the PSO signal may not meet the accuracy requirements we need, thus forcing the system to reduce production capacity to make up for the accuracy requirements

[0007] (3) According to the capacity design requirements of the system, the movement speed of the platform must reach Vmin. For most types of platforms, when the speed is above Vmin, the platform driver will not support PSO triggering at this speed, or PSO will occur. The problem of pulse signal loss

[0009] The above problems will seriously affect the key performance indicators of lithography equipment, and cannot meet the strict requirements of semiconductor and precision PCB production for equipment position accuracy

Images