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A lighting system and method

A technology of lighting system and scanning direction, applied in the field of lighting system, can solve the problems such as the requirement of field of view exceeding the size of the end face of the even light quartz rod, and achieve the effects of simple structure, no loss of energy and low cost

Active Publication Date: 2020-08-21
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] The present invention provides an illumination system and method to solve the problem in the prior art that the field of view requirement exceeding the size of the end face of a homogeneous quartz rod cannot be realized

Method used

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  • A lighting system and method
  • A lighting system and method

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Experimental program
Comparison scheme
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Embodiment 1

[0040] Such as image 3 As shown, the present invention provides an illumination system, including a light source 1, a uniform light unit 2, a field of view switching unit 3, a variable slit assembly 4, and a relay lens group unit 5 arranged in sequence along the optical path, and the field of view switching The unit 3 corresponds to the output surface of the dodging unit 2 . Specifically, the light source 1 includes an ellipsoidal bowl 11 and a mercury lamp 12 located at the first focus of the ellipsoidal bowl 11, the light emitted by the mercury lamp 12 is collected by the ellipsoidal bowl 11 and converged to the second focal point, and the coupling unit 6 includes Each lens of the coupling mirror group, the object plane of the mirror group is at the second focal point of the ellipsoid bowl 11, and the light gathered by the ellipsoid bowl 11 is coupled into the dodging unit 2 according to a certain NA (numerical aperture), and the dodging unit 2Using uniform light quartz ro...

Embodiment 2

[0047] The difference from Embodiment 1 is that in this embodiment, an integral uniformity compensation strip 7 is provided at the splicing position of two adjacent prisms 33 of the field of view prism assembly 31 along the non-scanning direction, and the integral uniformity compensation strip 7 7 is arranged obliquely relative to the splicing position, and is used to block part of the sub-fields of view of two adjacent prisms at the splicing position. In this embodiment, the field of view prism assembly 31 including two prisms is taken as an example for illustration, specifically as Figure 8a , 8b shown.

[0048] Since the illumination field of view finally output by the present invention is formed by splicing several (or single) sub-illumination fields of view, in order to improve the accuracy of sub-field of view splicing and reduce the Mura phenomenon caused by field of view splicing, in order to optimize the illumination field of view In this embodiment, an integral un...

Embodiment 3

[0051] Such as Figure 10 As shown, different from the above-mentioned embodiment 1-2, the field of view prism assembly 31 includes multiple groups of sub-field of view prism assemblies, and the multiple groups of sub-field of view prism assemblies are sequentially spliced ​​along the direction of the optical path, and two adjacent groups In the sub-field of view prism assemblies, the exit surfaces of the previous group of sub-field of view prism assemblies are matched and aligned with the incident surfaces of the latter group of sub-field of view prism assemblies, and each group of sub-field of view prism assemblies includes one or more prisms. A plurality of prisms are fixed on the same plane and sequentially spliced ​​along the scanning direction, and adjacent prisms are arranged in a dislocation along the non-scanning direction. Multiple sets of sub-field of view prism assemblies are respectively fixed on the mounting components of different planes. When switching the fiel...

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Abstract

The invention discloses a lighting system and method. The system comprises a light source, a dodging unit, a visual field switching unit, a variable slot assembly and a relay lens unit, wherein the visual field switching unit is corresponding to an emergent surface of the dodging unit so as to change a visual field size of the dodging unit. The number of sub-visual fields is determined by the visual field switching unit according to a scanning width of the lighting visual field, the size of a light spot is adjusted according to the number of the required sub-visual field, so that the visual field demand is satisfied. The function of visual field configuration and the function of dodging are separated, the on-line switching function of visual field configuration is achieved, the energy is not lost, and the illumination and integration uniformity of the visual field are not affected; by modularizing the dodging unit, all TFT photoetching machines use dodging quartz rods in the same specifications, the scanning exposure visual field with various long-width ratio requirements can be achieved, the system is low in cost and simple in structure and is efficient and safe, high modularization is achieved, and subsequent transformation, upgrading and maintenance are facilitated.

Description

technical field [0001] The invention relates to the field of photolithography machines, in particular to an illumination system and method. Background technique [0002] The main function of the illumination system in the lithography machine is to provide the correct size and shape of the illumination field of view on the mask surface, and to meet the lithography process requirements such as illumination, NA (numerical aperture), and uniformity in the field of view, for subsequent optical system used. The TFT (Thin Film Field Effect Transistor) lithography machine requires a relatively large aspect ratio of the illumination field of view, and at the same time, the scanning width of the illumination field of view in the TFT lithography machine is an important factor determining the lithography production process window. [0003] The scanning width of a TFT lithography machine determines its so-called "generation". In order to realize the perfect compatibility of the high-gen...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCG03F7/70058G03F7/70083G03F7/70091G03F7/7015G03F7/70191
Inventor 钱俊
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD