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Lighting system and method

A lighting system and scanning direction technology, which is applied in the field of lighting systems, can solve the problems that the field of view cannot be realized beyond the size of the end face of the uniform light quartz rod, and achieve the effect of simple structure, no energy loss, and convenient transformation

Active Publication Date: 2019-03-05
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] The present invention provides an illumination system and method to solve the problem in the prior art that the field of view requirement exceeding the size of the end face of a homogeneous quartz rod cannot be realized

Method used

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  • Lighting system and method
  • Lighting system and method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0040] Such as image 3 As shown, the present invention provides a lighting system, which includes a light source 1, a uniform light unit 2, a field of view switching unit 3, a variable slit assembly 4, and a relay lens group unit 5 arranged in sequence along the optical path. The unit 3 corresponds to the exit surface of the uniform light unit 2. Specifically, the light source 1 includes an ellipsoidal bowl 11 and a mercury lamp 12 located at the first focal point of the ellipsoidal bowl 11. The light emitted by the mercury lamp 12 is collected by the ellipsoidal bowl 11 and converged to the second focal point. The coupling unit 6 includes Each lens of the coupling lens group, the object surface of the lens group is at the second focal point of the ellipsoidal bowl 11, and the light condensed by the ellipsoidal bowl 11 is coupled into the homogenization unit 2 according to a certain NA (numerical aperture). The homogenization unit 2Using a homogeneous quartz rod, the light is ...

Embodiment 2

[0047] The difference from Embodiment 1 is that in this embodiment, an integral uniformity compensation strip 7 is provided at the splicing position of the two adjacent prisms 33 of the field of view prism assembly 31 along the non-scanning direction. 7 It is arranged obliquely relative to the splicing position, which is used to block part of the subfield of view of two adjacent prisms at the splicing position. In this embodiment, the field of view prism assembly 31 including two prisms is taken as an example for description. Figure 8a , 8b Shown.

[0048] Since the final illumination field of view output by the present invention is composed of several (or a single) sub-illumination field of view spliced ​​together, in order to improve the accuracy of sub-field splicing, reduce the Mura phenomenon caused by field of view splicing, and to optimize the illumination field of view In this embodiment, an integral uniformity compensation strip 7 is added at the splicing position of tw...

Embodiment 3

[0051] Such as Picture 10 As shown, the difference from the foregoing embodiment 1-2 is that the field of view prism assembly 31 includes multiple groups of sub-field of view prism assemblies, and the multiple sets of sub-field of view prism assemblies are successively spliced ​​along the optical path direction, and two adjacent groups are connected. In the sub-field-of-view prism components, the exit surface of the first group of sub-field-of-view prism components matches and aligns with the incident surface of the latter group of sub-field-of-view prism components. Each group of the sub-field prism components includes one or more prisms. A plurality of prisms are fixed on the same plane and sequentially spliced ​​along the scanning direction, and adjacent prisms are arranged in a staggered manner along the non-scanning direction. Multiple groups of sub-field-of-view prism assemblies are respectively fixed on mounting members on different planes. When switching the field of vi...

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PUM

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Abstract

The invention discloses a lighting system and method. The system comprises a light source, a dodging unit, a visual field switching unit, a variable slot assembly and a relay lens unit, wherein the visual field switching unit is corresponding to an emergent surface of the dodging unit so as to change a visual field size of the dodging unit. The number of sub-visual fields is determined by the visual field switching unit according to a scanning width of the lighting visual field, the size of a light spot is adjusted according to the number of the required sub-visual field, so that the visual field demand is satisfied. The function of visual field configuration and the function of dodging are separated, the on-line switching function of visual field configuration is achieved, the energy is not lost, and the illumination and integration uniformity of the visual field are not affected; by modularizing the dodging unit, all TFT photoetching machines use dodging quartz rods in the same specifications, the scanning exposure visual field with various long-width ratio requirements can be achieved, the system is low in cost and simple in structure and is efficient and safe, high modularization is achieved, and subsequent transformation, upgrading and maintenance are facilitated.

Description

Technical field [0001] The invention relates to the field of photoetching machines, in particular to an illumination system and method. Background technique [0002] The main function of the illumination system in the lithography machine is to provide the correct size and shape of the illumination field of view on the mask surface, and to meet the lithography process requirements such as illuminance, NA (numerical aperture), and uniformity in the field of view, for follow-up Optical system used. The TFT (Thin Film Field Effect Transistor) lithography machine requires a relatively large aspect ratio of the illumination field of view, and the scan width of the illumination field of view in the TFT lithography machine is an important factor that determines the lithography production process window. [0003] The scan width of the TFT lithography machine determines its so-called "generation". In order to achieve the perfect compatibility of the high-generation TFT lithography machine w...

Claims

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Application Information

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IPC IPC(8): G03F7/20
CPCG03F7/70058G03F7/70083G03F7/70091G03F7/7015G03F7/70191
Inventor 钱俊
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD