Mask plate, mask device and preparation method of mask plate

A mask and mask technology, applied in the field of mask preparation, mask device, and mask, can solve the problems of evaporation shadow evaporation color mixing, wrinkles, defects, etc.

Active Publication Date: 2019-03-08
BOE TECH GRP CO LTD
View PDF10 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The traditional FMM is made of Invar alloy (Invar), and the opening is made on it by etching. The thickness of the mask is usually 20-50 microns. The metal mask will have a large amount of sag due to gravity, and the tension Th

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Mask plate, mask device and preparation method of mask plate
  • Mask plate, mask device and preparation method of mask plate
  • Mask plate, mask device and preparation method of mask plate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0041] This embodiment provides a mask plate, which is used for preparing a display substrate, and is especially suitable for vapor deposition of each layer structure of an OLED device in an OLED display substrate.

[0042] The mask plate includes: a rigid transparent base and a toughness enhancement layer; the rigid transparent base has a first opening, and the first opening corresponds to the pixel unit of the display substrate; the toughness enhancement layer is arranged on the rigid transparent base to enhance the strength of the mask plate Toughness: the toughness enhancing layer is provided with second openings, and the second openings correspond to the first openings one by one.

[0043] The mask plate of this embodiment is composed of a rigid transparent substrate and a toughness enhancing layer. Among them, the rigid transparent base makes the mask have sufficient skeleton support strength, and does not produce excessive sagging like the metal mask in the prior art, a...

Embodiment 2

[0054] Such as figure 1 with 2 As shown, this embodiment provides a mask whose structure is similar to the mask provided in Embodiment 1, such as figure 1 As shown, the mask plate includes a rigid rigid transparent substrate and a flexible toughness enhancing layer 2 . In this embodiment, the material of the rigid transparent substrate is glass as an example for illustration.

[0055] In particular, in the mask plate provided in this embodiment, the toughness enhancing layer 2 is doped with magnetic nanoparticles, that is, when preparing the toughness enhancing layer 2, magnetic nanoparticles can be added to the toughness enhancing layer material 2A to form Flexible, magnetic toughness enhancing layer 2. Among them, the flexible material can include at least one of polyimide, polyethylene terephthalate, polyethylene naphthalate, polystyrene, and polypropylene; the material of magnetic nanoparticles includes magnetic metals or magnetic metal oxides.

[0056] In this embodi...

Embodiment 3

[0076] Such as image 3 with 4 As shown, this embodiment provides a mask whose structure is similar to that provided in Embodiment 1 and Embodiment 2, including a rigid rigid transparent substrate and a flexible toughness enhancing layer 2 .

[0077] In particular, in the mask plate of this embodiment, in addition to the toughness enhancing layer 2 , it also includes a magnetic layer 3 having third openings, and the third openings correspond to the first openings one by one. That is to say, in the mask plate of this embodiment, the mask plate has a certain magnetic property through another magnetic layer 3, and it is possible to ensure that the mask plate is compatible with the film to be evaporated while enhancing the toughness of the rigid transparent substrate. The high-quality display substrate can be closely attached under the action of a magnetic field, thereby avoiding evaporation shadows and improving the product yield of the display substrate.

[0078] Specifically,...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
Thicknessaaaaaaaaaa
Login to view more

Abstract

The invention provides a mask plate, a mash device and a preparation method of the mask plate, and belongs to the technical field of preparation of a display substrate. The mask plate is used for preparing the display substrate. The mask plate comprises a rigid transparent base with first openings, and a tough reinforcing layer arranged on the rigid transparent base and used for reinforcing the toughness of the mask plate. The first openings correspond to pixel units of the display substrate. The tough reinforcing layer is provided with second openings, and the second openings correspond to the first openings one to one.

Description

technical field [0001] The invention belongs to the technical field of display substrate preparation, and in particular relates to a mask, a mask device and a method for preparing the mask. Background technique [0002] In the prior art, FMM (Fine Metal Mask, high-precision metal mask) is usually used as an evaporation mask, and the organic light-emitting material is evaporated on the corresponding opening area on the array substrate through the opening on the FMM to form an OLED (Organic Light-Emitting Diode; organic electroluminescent diode) device. [0003] The traditional FMM is made of Invar alloy (Invar), and the opening is made on it by etching. The thickness of the mask is usually 20-50 microns. The metal mask will have a large amount of sag due to gravity, and the tension The stretching effect of the mesh will cause wrinkles, and the mask plate and the substrate will not fit well during evaporation, resulting in a gap, which will cause evaporation shadows and cause...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C23C14/04C23C14/24
CPCC23C14/042C23C14/24
Inventor 朱海彬董学袁广才王伟杰张峰杰
Owner BOE TECH GRP CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap