Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for rapidly estimating film thickness uniformity of hemispherical harmonic oscillator based on optical simulation

A hemispherical oscillator and optical simulation technology, applied in the direction of using optical devices, measuring devices, instruments, etc., can solve the problems of complex process, affecting oscillator performance, long experimental period, etc., achieving high timeliness, improved efficiency, and easy readability. sexual effect

Active Publication Date: 2019-03-12
CHINA ELECTRONICS TECH GRP NO 26 RES INST
View PDF8 Cites 9 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The thickness uniformity of the film layer on the surface of the vibrator will affect the performance of the vibrator. The film thickness uniformity can be optimized by adjusting the spatial relative position and angle of the target and the vibrator during coating, but this adjustment experiment period is long and the process is complicated.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for rapidly estimating film thickness uniformity of hemispherical harmonic oscillator based on optical simulation
  • Method for rapidly estimating film thickness uniformity of hemispherical harmonic oscillator based on optical simulation
  • Method for rapidly estimating film thickness uniformity of hemispherical harmonic oscillator based on optical simulation

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] Such as figure 1 As shown, this embodiment includes the following steps:

[0030] 1) Measurement: measurement in the vacuum chamber of the coating equipment, including but not limited to the measurement of the shape and structure of the target 2 in the coating equipment, the measurement of the target position, the measurement of the relative position between the coating station and the target; the sample that needs to be coated is hemispherical resonance Measurement of the external dimensions of sub-1;

[0031] 2) Three-dimensional modeling: establish a three-dimensional model of the coating chamber, and establish a real-scale three-dimensional simplified model in the computer according to the measurement results, including but not limited to structures such as the target model 20, chuck model 3, and transmission mechanism model 4; 3D simplified model of the sample to be coated;

[0032] 3) Definition of simulation conditions: regardless of scattering or diffraction, ...

Embodiment 2

[0036] In this embodiment, on the basis of Embodiment 1, when the first simulation is completed, the adjustment can be directly started from step 4) when the coating equipment and coating samples have not changed, that is, after step 5) is completed, return to Step 4), and repeating steps 4) and 5) multiple times to obtain the parameter combination that makes the uniformity of the film thickness optimal. At the same time, the simulation data fed back each time is used to summarize the rules, optimize the parameters, and finally obtain the parameter values ​​that make the film thickness uniformity meet the requirements. The parameters optimized by simulation can be used to adjust the relative position of the target and the sample in the actual coating work. Compared with Embodiment 1, this embodiment can estimate the film thickness uniformity more accurately; the parameters optimized through simulation can be used to adjust the relative positions of the target and the sample in...

Embodiment 3

[0038] On the basis of the previous two embodiments, when the coating equipment changes or the sample changes, the present invention only needs to re-measure the changed part and perform three-dimensional modeling, that is, when the parameter data measured by the chamber changes, then Update the three-dimensional model of the coating chamber; when the parameter data of the sample measurement changes, update the three-dimensional model of the coating sample; on the basis of the updated three-dimensional model, then perform condition setting, relative position adjustment and optical simulation step by step Estimated film thickness uniformity.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention belongs to the field of hemispherical resonant gyroscopes, particularly relates to a hemispherical resonant gyroscope harmonic oscillator metallizing process in a satellite inertial navigation system, and particularly provides a method for rapidly estimating the film thickness uniformity of a hemispherical harmonic oscillator based on optical simulation. The method includes the stepsthat cavity measuring and sample measuring are carried out in a vacuum cavity of coating equipment, and parameter data is acquired; three-dimensional models of a coating cavity and a coating sample are established according to the measured parameter data; in the three-dimensional models, the relative positions of the coating samples and targets are at least adjusted, the illumination parameter irradiance of the surface of the coating sample, namely the hemispherical harmonic oscillator is acquired through optical simulation, and the film thickness uniformity is estimated according to the irradiance. By means of the method, the film thickness uniformity can be effectively estimated, machine losses caused by repeated trials are avoided, and the cost is greatly reduced.

Description

technical field [0001] The invention belongs to the field of hemispherical resonant gyroscopes, in particular to a metallization process of hemispherical resonant gyroscope resonators in satellite inertial navigation systems; specifically, it is a method for quickly estimating the film thickness uniformity of hemispherical resonant gyroscopes based on optical simulation. Background technique [0002] Hemispherical Resonator Gyro (Hemispherical Resonator Gyro, referred to as HRG) is a kind of high-precision gyroscope with inertial navigation performance in the Costa Rica vibratory gyroscope. Hemispherical Resonator Gyro is a vibration rotation sensor with high precision, long life and high reliability. , low noise, anti-nuclear radiation, high impact resistance, etc., the random drift can reach the order of 10-4° / hr, can work continuously for more than 15 years and maintain the required performance, and is ideal for satellites, strategic weapons, and space aircraft. The most ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G01B11/06
CPCG01B11/06
Inventor 贺海平蒋春桥李陟
Owner CHINA ELECTRONICS TECH GRP NO 26 RES INST
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com