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Production method of rotating target

A production method and technology of rotating targets, applied in ion implantation plating, metal material coating process, coating, etc., can solve the problems of insufficient connection strength between the metal binding layer, the metal back tube and the target material, and avoid temperature too low effect

Inactive Publication Date: 2019-03-26
东曹(上海)电子材料有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In view of the problem of insufficient connection strength between the metal binding layer, the metal back pipe and the target material in the prior art, the purpose of the present invention is to provide a production method for a rotating target, which has the ability to improve the connection strength between the binding layer target material and the metal tube advantage

Method used

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  • Production method of rotating target

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Embodiment Construction

[0036] In order to make the purpose, technical solutions and beneficial effects of the present invention clearer, the present invention will be further described in detail below in conjunction with the examples and accompanying drawings, but the embodiments of the present invention are not limited thereto.

[0037] Such as figure 1 Shown, a kind of production method of rotating target comprises the steps:

[0038] Step S1: Perform pre-nickel plating on the side wall of the lining pipe and the inner wall of the target material, the nickel material is impact nickel, and the thickness is 100um, and conduct a tape test to check whether it is qualified;

[0039] Step S2: Put the lining pipe and the target material into a hot air circulation furnace for heating, and the heating temperature is between 150°C and 190°C;

[0040] Step S3: Evenly coat the side wall of the liner tube and the inner wall of the target with metal indium; measure the temperature of the liner tube and the tar...

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Abstract

The invention discloses a production method of a rotating target and relates to the technical field of rotating target processing. The production method comprises the following steps: S1, plating nickel to the side wall of a liner pipe and the inner wall of a target; S2, heating the liner pipe and the target; S3, coating a metal indium uniformly to the side wall of the liner pipe and the inner wall of the target; S4, cooling the liner pipe and the target to room temperature; S5, penetrating the liner pipe to the target, and fixing the two relatively; S6, heating the relatively fixed liner pipeand target at the same time; S7, filling the space between the liner pipe and the target with the metal indium; and S8, cooling the liner pipe, the target and the metal indium to room temperature. Inorder to solve the problem that the connecting strength between a metal binding layer and a metal back pipe and the target in the prior art is not enough, the connecting strength between the liner pipe and the target is improved by plating nickel to the side wall of the liner pipe and the inner wall of the target and taking nickel as an intermediate layer.

Description

technical field [0001] The invention relates to the technical field of rotary target processing, more specifically, it relates to a production method of a rotary target. Background technique [0002] The rotating target is a magnetron target. The target is made into a cylindrical shape with a stationary magnet inside, which rotates at a slow speed. [0003] For the existing rotating target structure, such as the Chinese patent with the patent publication number CN206366646U, it discloses a metal sealing system for ceramic rotating target bonding, including a metal back tube and a first metal back tube sleeved outside the metal back tube. The ceramic rotating target, the metal back tube and the first ceramic rotating target are sealed at the bottom by a plug to form a cavity; the metal back tube is provided with an internal heater inside the tube, and the first ceramic rotating target is provided with an external heater ; A low melting point metal binding layer is cast in th...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35
CPCC23C14/3414C23C14/35
Inventor 卢建栋张小伟张扬
Owner 东曹(上海)电子材料有限公司
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