Automatic control method for polysilicon reduction furnace

A reduction furnace and polysilicon technology, applied in the direction of program control, computer control, general control system, etc., can solve the problems of falling rods, loosening, wrong command, etc.

Active Publication Date: 2019-03-29
ORISI SILICON
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  • Abstract
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  • Application Information

AI Technical Summary

Problems solved by technology

This control method requires a high level of experience for on-site personnel, and after taking over the shift, the employees do not understand the production status of the previous reduction furnace, which is prone to misdirection; in addition, due to the limited number of on-site personnel, they cannot always keep an eye on the production status of the reduction furnace. When the situation in the furnace changes, it cannot be adjusted in time, and it is prone to serious quality problems such as falling rods, atomization, and looseness.

Method used

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  • Automatic control method for polysilicon reduction furnace
  • Automatic control method for polysilicon reduction furnace
  • Automatic control method for polysilicon reduction furnace

Examples

Experimental program
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Embodiment 1

[0069] Such as figure 1 , figure 2 In the shown automatic control method of a polysilicon reduction furnace, the temperature of the silicon rod 4 and the growth image of the silicon rod 4 in the reduction furnace 3 are collected by the temperature measuring device 1 and the camera device 2, and uploaded to the industrial computer 5 for data recording, image analysis and Logic operation, to obtain the reduction furnace current, reduction furnace feed amount and reduction furnace ratio in each time period, and then control the action of the reduction furnace actuator 7 to realize the reduction furnace temperature, reduction furnace feed amount and reduction furnace Proportioning automatic control.

[0070] The automatic control steps of the reduction furnace temperature are as follows:

[0071] (1) After the initial feeding of the reduction furnace, start to record the temperature of the silicon rod. In practical applications, it is usually set to start recording the temperat...

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Abstract

The invention discloses an automatic control method for a polysilicon reduction furnace. The temperature of the silicon rod and the growth image of a silicon rod in a reduction furnace are collected by a temperature measuring device and a camera device, and are uploaded to an industrial computer for data recording, image analysis and logic operation to obtain the current, the feed quantity and theratio of the reduction furnace in each time section to control the motion of a reduction furnace execution mechanism so as to achieve the automatic control of the temperature, the feed quantity and the ratio of the reduction furnace in each time section. The automatic control method for a polysilicon reduction furnace can control the reduction furnace to in an optimal operation state to reduce the phenomenon of cracking or barging of the silicon rod, improve the apparent quality of the polysilicon, reduce the experience requirement for the field personnel, reduce the work of the operators, reduce the operation electrification consumption of the reduction furnace and save the raw material gases.

Description

Technical field: [0001] The invention relates to the field of polysilicon reduction, in particular to an automatic control method for a polysilicon reduction furnace. Background technique: [0002] Polysilicon is the basic raw material of the electronics industry and solar energy industry, and is widely used in semiconductor chips, high-performance sensors, optical fibers, solar panels, etc. At present, the polysilicon production technology at home and abroad mostly adopts the improved Siemens method, that is, through the chemical vapor deposition reaction of trichlorosilane and hydrogen on the surface of the high-temperature silicon rod energized in the reduction furnace under high temperature conditions, high-purity polysilicon is obtained until the silicon in the furnace The rod diameter gradually increases to the specified rod diameter. During the growth process of silicon rods, the deposition rate of silicon rods in the reduction furnace is an important factor determin...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G05B19/042C01B33/035
CPCC01B33/035G05B19/042
Inventor 姜海明吴锋杨媛丽曹忠陈晓军
Owner ORISI SILICON
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