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Light source and generation method of extreme ultraviolet radiation, and extreme ultraviolet lithography technology

A technology of extreme ultraviolet light and light source, applied in the field of extreme ultraviolet light, which can solve problems such as damage and deterioration

Active Publication Date: 2019-04-05
TAIWAN SEMICON MFG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Collectors can be damaged and degraded by the effects of particles, ions, radiation and, most seriously, tin deposits

Method used

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  • Light source and generation method of extreme ultraviolet radiation, and extreme ultraviolet lithography technology
  • Light source and generation method of extreme ultraviolet radiation, and extreme ultraviolet lithography technology
  • Light source and generation method of extreme ultraviolet radiation, and extreme ultraviolet lithography technology

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Embodiment Construction

[0059] The following disclosure provides many different embodiments, or examples, for implementing different features of the disclosure. Specific examples of each component and its arrangement are described below to simplify the description. Of course, the examples are for illustration only and are not intended to be limiting. For example, if the specification describes that the first feature is formed on or above the second feature, it means that the embodiment that the above-mentioned first feature is in direct contact with the above-mentioned second feature may also be included, and it may also include that additional features are formed on the above-mentioned first feature. Between a feature and the above-mentioned second feature, the above-mentioned first feature and the second feature may not be in direct contact with each other. In addition, the same reference signs and / or signs may be reused in different examples of the following disclosure. These repetitions are for...

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Abstract

The disclosure provides a light source and a generation method of extreme ultraviolet radiation, and an extreme ultraviolet lithography technology. A light source for extreme ultraviolet (EUV) radiation is provided. The light source includes a target droplet generator, a laser generator, a measuring device, and a controller. The target droplet generator is configured to provide a plurality of target droplets to a source vessel. The laser generator is configured to provide a plurality of first laser pulses according to a control signal to irradiate the target droplets in the source vessel, so as to generate plasma as the EUV radiation. The measuring device is configured to measure process parameters including temperature of the source vessel, droplet positions of the target droplets, and beam sizes and focal points of the first laser pulses. The controller is configured to provide the control signal according to at least two of the process parameters.

Description

technical field [0001] The present disclosure relates to extreme ultraviolet light technology, and in particular to a light source for extreme ultraviolet light radiation, an extreme ultraviolet light lithography system for performing a lithography exposure process, and a method for producing extreme ultraviolet light radiation. Background technique [0002] The semiconductor integrated circuit (IC) industry has experienced exponential growth. Advances in integrated circuit materials and design technology have produced several generations of integrated circuits, each generation of integrated circuits has smaller and more complex circuits than the previous generation. During the evolution of integrated circuits, functional density (ie, the number of interconnected devices per chip area) has generally increased as geometry size (ie, the smallest element (or line) that can be created using a fabrication process) has decreased. Such scaling processes generally provide benefits b...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/2004G03F7/2041G03F7/70008G03F7/70033G03F7/70533H05G2/005H05G2/008G03F7/70891G03F7/70025
Inventor 杨基陈思妤简上杰谢劼傅中其刘柏村陈立锐郑博中
Owner TAIWAN SEMICON MFG CO LTD