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Photon radiation microscope sample holder, testing method and microscope device

A technology of photon radiation and microscopy, applied in microscopes, measuring devices, electronic circuit testing, etc., can solve the problems of inability to accurately locate the Hotspot position, 100X probes cannot be focused, and easily damage samples and probes, etc., so as to broaden the scope of use and improve The efficiency of failure analysis and the effect of saving testing costs

Inactive Publication Date: 2019-04-16
SHANGHAI HUALI INTEGRATED CIRCUTE MFG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This method enables the back-detecting EMMI / OBIRCH to have the ability to analyze and apply from the front, but this method is complicated to prick the needle from the bottom up and is easy to damage the sample and the probe; the U-shaped probe is located below the sample, causing the 100X probe to fail to focus , unable to precisely locate the Hotspot location

Method used

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  • Photon radiation microscope sample holder, testing method and microscope device
  • Photon radiation microscope sample holder, testing method and microscope device
  • Photon radiation microscope sample holder, testing method and microscope device

Examples

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Effect test

Embodiment 1

[0042] Embodiment 1 sample holder

[0043] Such as Figure 4-8 As shown, the photon radiation microscope sample holder 10 of the present invention includes: a substrate 11 , a metal electrode 13 , a support 15 , a base 16 , and a bonding wire 14 .

[0044]The substrate 11 is preferably a square PCB board. Preferably, the substrate 11 has a side length of 50-80 mm and a height of 5 mm. The substrate is provided with a sample carrying area for carrying samples; the sample carrying area runs through the substrate along the vertical direction; the sample carrying area is provided with a carrying plate 12 of light-transmitting material; preferably, the carrying Plate 12 is a quartz glass plate. In this embodiment, the quartz glass plate is arranged in the central area of ​​the substrate, the side length of the quartz glass plate is 25-50 mm, and the height is 3 mm.

[0045] The metal electrode 13 is arranged in the substrate and penetrates the substrate along the vertical direct...

Embodiment 2

[0049] Embodiment 2 Backside Detection Photon Radiation Microscope Equipment and Detection Method

[0050] Such as Figure 9 Shown, the photon radiation microscope equipment of a preferred embodiment of the present invention, it is the photon radiation microscope equipment of back detection type, and it comprises: Probe seat 20, equipment carrying platform 30, optical lens 40, detector 50, observation microscope 60.

[0051] The probe base 20 has an upper surface for supporting the probe base 20 , a probe arm 21 is disposed on the probe base 20 , and a probe 22 is disposed on the probe arm 21 .

[0052] The equipment carrying platform 30 is used for carrying the sample holder of the photon radiation microscope.

[0053] The optical lens 40 is arranged below the sample stage and the probe stage for optical focusing, and there is a gap between the optical lens 40 and the equipment carrying table 30, the probe holder 20, the probe arm 21 and the probe 22. The safe working dist...

Embodiment 3

[0061] Embodiment 3 Front-side detection photon radiation microscope equipment and detection method

[0062] Such as Figure 10 As shown, the photon radiation microscope device of a preferred embodiment of the present invention is a front-side detection photon radiation microscope device, which includes: a probe base 20 , a device carrier 30 , an optical lens 40 , and a detector 50 .

[0063] The probe base 20 has an upper surface for supporting the probe base 20 , a probe arm 21 is disposed on the probe base 20 , and a probe 22 is disposed on the probe arm 21 .

[0064] The equipment carrying platform 30 is used for carrying the sample holder of the photon radiation microscope.

[0065] The optical lens 40 is arranged above the sample stage and the probe stage for optical focusing, and there is a gap between the optical lens 40 and the equipment carrying table 30, the probe holder 20, the probe arm 21 and the probe 22. The safe working distance, the optical lens described i...

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Abstract

The invention discloses a photon radiation microscope sample holder, which comprises a substrate, metal electrodes, and bonding wires, wherein the substrate is provided with a sample bearing area forbearing a sample; the sample bearing area penetrates through the substrate along the vertical direction; a bearing plate made of a light-transmitting material is arranged in the sample bearing area; the metal electrode is arranged in the substrate and penetrates through the substrate in the vertical direction; and the bonding wire is used for electrically connecting the pricking area of the to-be-tested sample with the metal electrode. According to the invention, the original front / back detection type EMMI / OBIRCH application analysis equipment has the capability of carrying out analysis and application from two sides. The defect position can be more conveniently, quickly and accurately positioned.

Description

technical field [0001] The invention relates to the field of microelectronics manufacturing, in particular to a sample seat and a testing method of a photon radiation microscope. The invention also relates to a photon radiation microscope device. Background technique [0002] With the reduction of device size and reduction of operating voltage, the number of metal interconnection layers in the back-end of the chip gradually increases, and the failure location of samples becomes more and more complicated. EMMI (photon radiation microscope) and OBIRCH (photon-induced impedance change microscope) are the most common equipment used for sample failure location. EMMI mainly captures the photon signal generated by device leakage for failure location, and OBIRCH mainly captures the photon signal generated by the laser scanning chip. The laser signal fed back by the resistance change is used to locate the failure. According to the failure mode of the chip, the industry mainly adopt...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01R31/311G01R31/28G02B21/34
CPCG01R31/2867G01R31/311G02B21/34
Inventor 丁德建刘海岸曹茂庆
Owner SHANGHAI HUALI INTEGRATED CIRCUTE MFG CO LTD
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