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Apparatus and method for correcting array astigmatism in a multi-column scanning electron microscope system

An electron microscope, electron optics technology, applied in circuits, discharge tubes, electrical components, etc., to solve problems such as distorted image planes

Active Publication Date: 2021-05-07
KLA CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

If the aperture is not round, then astigmatism is introduced into the lens field causing a distorted image plane

Method used

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  • Apparatus and method for correcting array astigmatism in a multi-column scanning electron microscope system
  • Apparatus and method for correcting array astigmatism in a multi-column scanning electron microscope system
  • Apparatus and method for correcting array astigmatism in a multi-column scanning electron microscope system

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Embodiment Construction

[0022] Reference will now be made in detail to the disclosed subject matter illustrated in the accompanying drawings.

[0023] generally refer to Figures 1 to 5 , discloses an apparatus and method for correcting array astigmatism in a multi-column scanning electron microscope (SEM) system according to the present invention.

[0024] Embodiments of the present invention are directed to a scanning electron microscope (SEM) system comprising a multi-beam lens array. Additional embodiments of the present invention are directed to correcting astigmatism in SEM systems due to aperture shape variations in a multi-beam lens array via one or more multipole beam deflectors within the multi-beam lens array. Additional embodiments of the present invention are directed to correcting for aperture shape variations in a multi-beam lens array via one or more sets of slotted beam astigmatism correction devices within the multi-beam lens array in an SEM system. astigmatism.

[0025] figure...

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Abstract

The invention discloses a multi-electron beam scanning electron microscope SEM system. The system includes an electron beam source configured to generate a source electron beam. The system includes a set of electron optical elements configured to generate a flood beam of electrons from the source electron beam. The system includes a multi-beam lens array having: a plurality of electron optical paths configured to split the flooded electron beam into a plurality of primary electron beams; and a plurality of charged array layers configured to adjust At least some of the plurality of primary electron beams. The system includes a set of electron optical elements configured to direct at least some of the plurality of primary electron beams onto a surface of a sample held by a stage. The system includes a detector array configured to detect a plurality of electrons emitted from the surface of the sample in response to the plurality of primary electron beams.

Description

[0001] Cross References to Related Applications [0002] This application asserts a claim under 35 U.S.C. § 119(e) of the inventor named Alan Brodie, filed September 8, 2016, entitled ARRAYED ASTIGMATISM CORRECTION. Priority to US Provisional Patent Application No. 62 / 385,084, which is hereby incorporated by reference in its entirety. technical field [0003] The present invention relates generally to wafer inspection and inspection, and more particularly to correction of array astigmatism in scanning electron microscope systems for use during wafer and photomask / reticle inspection and inspection. Background technique [0004] The fabrication of semiconductor devices, such as logic and memory devices, typically involves processing the semiconductor device using a multitude of semiconductor processes to form various features and layers of the semiconductor device. Some processes utilize photomasks / reticles to print features on semiconductor devices such as wafers. As semic...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01J37/28H01J37/22
CPCG01N23/2251H01J37/28H01J37/153H01J2237/1532H01J37/226H01J2237/2813
Inventor A·布罗迪
Owner KLA CORP