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Electrodeposition copper recovery device and copper recovery production line using same

A technology for recovering copper and electrodeposition, applied in the field of copper recovery production lines and electrodeposition recovery copper devices, can solve the problems of uneven concentration, uneven shape, and low efficiency, and achieve the effects of uniform concentration, uniform shape, and improved efficiency.

Pending Publication Date: 2019-06-07
株洲稷维环境科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] The cleaning section of production lines such as etching PCB boards, electroplating copper, and chemical copper plating will discharge a large amount of copper-containing alkaline etching solution, and the etching solution contains a large amount of copper elements. If the copper-containing alkaline etching solution is directly discharged, copper resources will be wasted. will seriously pollute the environment
[0003] For copper-containing alkaline etching solution, copper can be recovered by electrolytic deposition, but in the prior art, the concentration of alkaline etching waste liquid in the electrodeposition device is not uniform, which leads to low efficiency when copper ions are reduced on the cathode plate , the problem of uneven shape

Method used

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  • Electrodeposition copper recovery device and copper recovery production line using same

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Embodiment

[0021] In this embodiment, a copper recovery production line (not shown) is provided for electrolysis of copper sulfate, including an electrodeposition recovery copper device, where, such as figure 1 As shown, the electrodeposition recovery copper device includes: a cylinder block 1, a cathode (not shown), an anode (not shown), an upper cover 2 and a circulation assembly 3. The cylinder block 1 includes a bottom plate 11 and a side plate 12, and a bottom plate 11 and The side plate 12 encloses the reaction tank, the cathode and anode are arranged in the reaction tank, the upper cover 2 is used to cover and seal the reaction tank, and the circulation assembly 3 includes an overflow box 31, an overflow pipe, a pump body and a spray structure 32. The overflow box 31 is arranged on the side plate 12 near the notch of the reaction tank, the overflow box 31 is in communication with the reaction tank, the spray structure 32 is arranged at the bottom of the reaction tank, and the spray ...

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Abstract

The invention provides an electrodeposition copper recovery device and a copper recovery production line using the same. The copper recovery production line comprises the electrodeposition copper recovery device, wherein the electrodeposition copper recovery device comprises a cylinder body, a cathode, an anode, an upper cover and a circulating assembly; the cylinder body comprises a bottom plateand side plates; a reaction tank is defined by the bottom plate and the side plates; and a circulating assembly comprises an overflow box, an overflow pipe, a pump body and a spraying structure. Whenalkaline etching waste liquid is charged into the reaction tank for electrolysis, the alkaline etching waste liquid flows from the reaction tank to the overflow box, then, by the driving of the pump body, the alkaline etching waste liquid in the overflow box flows through the overflow pipe, a liquid inlet pipe and a spraying pipe, and finally the alkaline etching waste liquid is sprayed from sprayholes on the spray pipe to the bottom of the reaction tank, so that a closed loop for flowing the alkaline etching waste liquid is formed, the etching waste liquid at different heights in the reaction tank is fully mixed to make the concentration be more uniform, the efficiency of reducing copper ions on a cathode plate can be effectively improved, and the shapes of the reduced copper ions are more uniform.

Description

Technical field [0001] The invention belongs to the technical field of copper recovery, and in particular relates to an electrodeposited copper recovery device and a copper recovery production line using the same. Background technique [0002] The cleaning section of the production line for etching PCB boards, electroplating copper, electroless copper plating, etc. will discharge a large amount of copper-containing alkaline etching solution, and the etching solution contains a large amount of copper elements. If the copper-containing alkaline etching solution is directly discharged, copper resources will be wasted. It will also seriously pollute the environment. [0003] For copper-containing alkaline etching solutions, the electrolytic deposition method can be used to recover copper. However, in the prior art, the concentration of the alkaline etching waste solution in the electrodeposition device is uneven, which results in low efficiency when copper ions are reduced on the catho...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C25C1/12C25C7/00C25C7/06
CPCY02P10/20
Inventor 李建光
Owner 株洲稷维环境科技有限公司