Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Design and preparation methods of magnetic tunnel junction based on Fe3N/GaN heterostructure

A magnetic tunnel junction and heterostructure technology, applied in the field of information industry, can solve the problems of low spin injection efficiency, mismatch between ferromagnetic electrodes and insulating conductance, etc., and achieve the effect of improving spin injection efficiency

Active Publication Date: 2019-06-07
NANJING UNIV OF POSTS & TELECOMM
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The ferromagnetic electrode of the traditional magnetic tunnel junction is usually made of metal materials such as Fe, so the conductance of the ferromagnetic electrode and the insulating (semiconductor) tunneling layer does not match, which leads to low spin injection efficiency

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Design and preparation methods of magnetic tunnel junction based on Fe3N/GaN heterostructure

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0018] The technical solution of the present invention will be further described in detail below in conjunction with the accompanying drawings.

[0019] Based on Fe 3 Design and preparation method of a magnetic tunnel junction of N / GaN heterostructure, the design of the magnetic tunnel junction includes a substrate 1, and a ferromagnetic electrode 2, a barrier layer 3, and a ferromagnetic electrode sequentially arranged on the substrate 4. Pinning layer 5, protective layer 6.

[0020] Described preparation method comprises the steps:

[0021] In step 1, a (0006)-oriented single-crystal sapphire film is used as a substrate 1, and it is cleaned with alcohol in an ultrasonic cleaner for 5 minutes.

[0022] Step 2, on the sapphire substrate 1 in step 1, utilize the magnetron sputtering method to sputter a layer of (002) oriented Fe 3 N thin film, as the ferromagnetic electrode 2. Among them, the purity of the iron target is not less than 99.99%, and the condition is that the c...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses design and preparation methods of a magnetic tunnel junction based on a Fe3N / GaN heterostructure. The designed magnetic tunnel junction comprises a substrate and further comprises a ferromagnetic electrode, a barrier layer, a ferromagnetic electrode, a pinning layers and a protective layer which are arranged on the substrate sequentially. The preparation method comprises the following steps that 1, a monocrystal sapphire film serves as the substrate, and cleaned in an ultrasonic cleaner through alcohol for five minutes; 2, a layer of Fe3N film is sputtered on the sapphire substrate in the step 1 through a magnetron sputtering method to serve as one of the ferromagnetic electrode; 3, a layer of GaN film is sputtered on the surface of a sample obtained in the step 2 to serve as the barrier layer; 4, a layer of Fe3N film is sputtered on the surface of a sample obtained in the step 3 to serve as the other ferromagnetic electrode; and 5, the IrMn pinning layer and the Ru protecting layer are formed on the surface of a sample obtained in the step 4 sequentially through a standard technology. Through material selection, the ferromagnetic electrodes and an electricconductor of a tunneling layer are better matched, and thus the spin injection efficiency is improved.

Description

technical field [0001] The invention relates to a Fe-based 3 The invention relates to a design and preparation method of a magnetic tunnel junction of N / GaN heterostructure, belonging to the field of information industry. Background technique [0002] The magnetic tunnel junction refers to an extremely thin insulating layer with a thickness of several nanometers sandwiched between two ferromagnetic sheets to form a so-called junction element. In ferromagnetic materials, due to the quantum mechanical exchange effect, the 3d orbital localized electronic energy bands of ferromagnetic metals are split, so that the spin-up and spin-down electrons near the Fermi surface have different energy state densities. In MTJs, the mechanism of the TMR effect is the spin-dependent tunneling effect. The general structure of MTJs is a sandwich structure of ferromagnetic layer / nonmagnetic insulating layer / ferromagnetic layer (FM / I / FM). At saturation magnetization, the magnetization direction...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01L43/08H01L43/10H01L43/12H10N50/10H10N50/01
Inventor 方贺男李影彭祥陶志阔
Owner NANJING UNIV OF POSTS & TELECOMM
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products