Array substrate and manufacturing method, liquid crystal display device and driving method
A technology of an array substrate and a manufacturing method, applied in the field of liquid crystal display, can solve the problems of not being able to guarantee that ion impurities will not be introduced, and it is difficult to make breakthrough improvements in the afterimage improvement effect, so as to increase the privacy protection effect, improve the coupling effect, The effect of improving stability
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no. 1 example
[0044] Please refer to Figure 1 to Figure 2 The first embodiment of the present invention provides an array substrate 20 , including a transparent substrate 23 and a common electrode 24 , an insulating layer 25 , a pixel electrode 26 and an alignment layer 27 sequentially disposed on the transparent substrate 23 . On the array substrate 20, a plurality of pixel units P are defined by a plurality of scanning lines 21 and a plurality of data lines 22 insulated from each other, and a pixel electrode 26 is arranged in each pixel unit P, and the pixel electrode 26 passes through a first thin film transistor (TFT) 281 is connected to the scan line 21 and the data line 22 adjacent to the first thin film transistor 281 .
[0045] The pixel electrode 26 is a comb-shaped structure having first electrode strips 261 and first slits 262, and the rest of the insulating layer 25 is etched and thinned except for the position corresponding to the first electrode strip 261 of each pixel electr...
no. 2 example
[0052] Please refer to Figure 5 to Figure 7 The second embodiment of the present invention provides an array substrate 20 , including a transparent substrate 23 and a common electrode 24 , an insulating layer 25 , a pixel electrode 26 and an alignment layer 27 sequentially disposed on the transparent substrate 23 . The array substrate 20 is defined by a plurality of scanning lines 21 and a plurality of data lines 22 insulated from each other to form a plurality of pixel units P, and a pixel electrode 26 is arranged in each pixel unit P, and the pixel electrode 26 passes through a first thin film transistor (TFT) 281 It is connected to the scan line 21 and the data line 22 adjacent to the first thin film transistor 281 .
[0053] A plurality of common lines 29 are also provided on the array substrate 20, and the plurality of common lines 29 extend in the same direction as the plurality of data lines 22, and each of the plurality of data lines 22 arranged side by side forms a p...
no. 3 example
[0062] Please refer to Figure 10a to Figure 10e , the third embodiment of the present invention provides a method for manufacturing the above-mentioned array substrate 20, including steps:
[0063] Please refer to Figure 10a , after forming the TFT array on the transparent substrate 23, deposit the first transparent conductive layer on the TFT array, and etch and pattern the first transparent conductive layer to form the common electrode 24; wherein the transparent substrate 23 can be a glass substrate Or a plastic substrate. Fabrication of a TFT array on the transparent substrate 23 is well known to those skilled in the art, and will not be repeated here.
[0064] Please refer to Figure 10b , depositing an insulating layer 25 on the common electrode 24; wherein, the insulating layer 25 is, for example, silicon oxide (SiOx), silicon nitride (SiNx), or silicon oxynitride (SiONx).
[0065] Please refer to Figure 10c , depositing a second transparent conductive layer on t...
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