Zwitterion compounds and photoresists comprising same
A technology of photoresist and zwitterion, which is applied in the field of zwitterion compounds and can solve the problems of large resist exposure time and so on
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example 1
[0120] Example 1: Te-Zwitterion Synthesis:
example 1A
[0121] Example 1A: The reactions describing the synthesis of the zwitterionic compound designated DTTe-HPTFBS (4) are shown in Scheme 1 below (after Example 1B). The synthesis of compound 1 is described in Naddaka, V.I. et al. Zhurnal Organicheskoi Khimii, 23(4), 887-8; 1987. The synthesis of Compound 2 is described in U.S. Patent Application Publication No. US20120172555A1 by Coley et al. A solution of compound 1 (3.0 g, 7.17 mmol) and compound 2 (1.50 g, 7.20 mmol) in 20 mL of acetonitrile was stirred at room temperature for 16 hours. The reaction mixture was concentrated and poured into heptane to give the product, named DTTe-HPTFBS (4). This zwitterion (4) can be used as a photoacid generator in a photoresist composition.
example 1B
[0122] Example 1B: A reaction describing the synthesis of a zwitterionic compound designated DTTe-HPPrS (5) is shown in Scheme 1 below. The synthesis of compound 1 is described in Naddaka, V.I. et al. Zhumal Organiccheskoi Khimii, 23(4), 887-8;1987. A solution of compound 1 (3.0 g, 7.17 mmol) and compound 3 (0.87 g, 7.17 mmol) in 20 mL of acetonitrile was stirred at room temperature for 16 hours. The reaction mixture was concentrated and poured into heptane to give DTTe-HPPrS (5). This zwitterion (5) can be used as a photoacid generator in a photoresist composition.
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[0124] plan 1
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