Circuit compensation device applied to fringe screen notch area
A compensating device and circuit technology, applied in circuits, electrical components, electrical solid devices, etc., can solve problems such as affecting parasitic capacitance, and achieve the effect of ensuring stability and avoiding notchmura
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment
[0021] Connect the gate line (Gate line) of each row in the notch display area of Liu Haiping to the outside of the AA area (active area, display area) above the panel (Panel) to form a compensation area, through Gate / ILD (Inter Layer Dielectric interlayer dielectric) / SD (Source Drain, source and drain layer, mainly used for the source and drain of the TFT of the pixels in the AA area and the surrounding SD wiring) forms a parasitic capacitance to increase the load of a single row of pixels in the notch display area. From top to bottom, the compensation device is source-drain layer (SD) 04, ILD interlayer dielectric layer 03, GI layer (Gate interlayer layer) 01 and poly layer (polysilicon layer) 00, and Gate layer (gate layer) 02 is located In the ILD interlayer dielectric layer 03. Among them, the poly layer is polysilicon with a thickness of 500 angstroms; the GI layer is silicon oxide and / or silicon nitride with a thickness of 2500 angstroms; the gate layer is molybdenum...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com