Semiconductor wafer cutting device with pneumatic stability and based on magnetic pole pressurizing principle
A cutting device and semiconductor technology, applied in the semiconductor field, can solve problems such as wash-off, wafer integrity restrictions, etc., and achieve the effect of increasing sliding
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[0030] See Figure 1-Figure 7 , The present invention provides a pneumatically stable semiconductor wafer cutting device based on the principle of magnetic pole pressurization. The structure includes an observation shaft base 1, a moving platform 2, a gantry guide 3, a fixed base 4, a processing turntable 5, and a cutter 6. The turntable 5 is installed in the middle of the surface of the fixed base 4 by buckling. The fixed base 4 is provided with a gantry guide 3 at the top and rear end. The bottom of the mobile platform 2 is installed on the upper end of the gantry guide 3 by buckling. The rear end of the shaft base 1 is fitted with the front end of the mobile platform 2, and the cutter 6 is installed at the bottom of the observation shaft base 1 by buckling. Through the observation of the shaft base 1, the cutting work of the cutter 6 can be enlarged and observed. The processing turntable 5 is used to place the processed wafer plates.
[0031] The cutter 6 incl...
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