Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Enhanced coupling type surface plasmon generation light source

A surface plasmon and light source technology, applied in the field of plasmon light source, to achieve the effect of good controllability and enhanced intensity

Inactive Publication Date: 2019-07-12
金华伏安光电科技有限公司
View PDF0 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Most of the current research focuses on the strong coupling between surface plasmons and excitons in dyes or small molecules, but there is little research on the strong coupling between surface plasmons and excitons in semiconductor quantum dots

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Enhanced coupling type surface plasmon generation light source
  • Enhanced coupling type surface plasmon generation light source
  • Enhanced coupling type surface plasmon generation light source

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0023] This embodiment provides a figure 1 , figure 2 The shown enhanced-coupling surface plasmon generating light source includes a substrate layer 1, which can be made of silicon dioxide, which mainly plays a supporting role, and a light-guiding layer 2 is arranged above the substrate layer 1, A heat-sensitive adjustment layer 3 is arranged above the light guide layer 2, a reflective layer 4 is arranged above the heat-sensitive adjustment layer 3, an electric heating plate 5 is arranged above the light-reflective layer 4, and the heat-sensitive adjustment layer The inside of 3 is provided with a plurality of periodically arranged light-emitting strips 6; the two ends of the light-emitting strips 6 are respectively connected to the electrode plates 7 arranged on the front and rear sides of the thermosensitive adjustment layer 3, so that the electrode plates 7, light-emitting strips 6, The electrode plate 7 constitutes a power supply circuit. When the power is turned on, the...

Embodiment 2

[0031] This embodiment provides a image 3 The shown enhanced-coupling surface plasmon generating light source includes a substrate layer 1, which can be made of silicon dioxide, which mainly plays a supporting role, and a light-guiding layer 2 is arranged above the substrate layer 1, A heat-sensitive adjustment layer 3 is arranged above the light guide layer 2, a reflective layer 4 is arranged above the heat-sensitive adjustment layer 3, an electric heating plate 5 is arranged above the light-reflective layer 4, and the heat-sensitive adjustment layer The inside of 3 is provided with a plurality of periodically arranged light strips 6, such as image 3 , Figure 4 As shown, the cross-section of the light-emitting strip 6 is rectangular, and the angle between the cross-section of the light-emitting strip 6 and the horizontal plane is α; The plate 7 is connected, and the electrode plate 7, the light-emitting strip 6, and the electrode plate 7 constitute a power supply circuit...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
heat deflection temperatureaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention relates to an enhanced coupling type surface plasmon generation light source. The light source comprises a substrate layer, a light guide layer is arranged above the substrate layer, a thermosensitive adjusting layer is arranged above the light guide layer, a reflecting layer is arranged above the thermosensitive adjusting layer, an electric heating plate is arranged above the reflecting layer, and a plurality of periodically arranged light-emitting strips are arranged inside the thermosensitive adjusting layer; the two ends of the light-emitting strip are connected with electrode plates arranged on the front side and the rear side of the thermosensitive adjusting layer respectively. The enhanced coupling type surface plasmon generation light source comprises a substrate, a reflecting layer is arranged above the light source; the height of the reflective layer is adjusted through temperature; according to the surface plasmon light source, the phase of the reflected lightis adjusted, so that the reflected light is coupled with the direct light of the light-emitting strip, the intensity of the surface plasmon light source propagated on the light guide layer is enhanced, the controllability of the light source is good, and the obtained surface plasmon light property can be adjusted at any time according to needs and is very convenient.

Description

technical field [0001] The invention belongs to the technical field of surface plasmon light sources, in particular to an enhanced coupling surface plasmon light source. Background technique [0002] Surface plasmons (SurfacePlasmons, SPs) are an electromagnetic surface wave formed by the coherent oscillation of free electrons at the interface of a metal medium. Because SPs can realize the transmission and manipulation of light in the sub-wavelength range, and can generate significantly enhanced local optical fields in some special metal micro-nano structures, it is widely used in biosensors, enhanced surface Raman scattering and photonic circuits, etc. There are important applications in many fields. In recent years, the combination of noble metal nanoparticles and semiconductor nanostructures to obtain an optically resonant system has aroused an upsurge of research because of its unique and excellent properties different from those of composite monomers. The locally enha...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/01G02B5/00
CPCG02B5/008G02F1/0102
Inventor 不公告发明人
Owner 金华伏安光电科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com