Lifting mechanism, lifting platform device, photoetching machine and photoetching method

Abstract

The invention provides a lifting mechanism, a lifting platform device, a photoetching machine and a photoetching method. The lifting mechanism comprises a box body, a worm, a worm gear and a screw rod, wherein the worm gear is driven to rotate when the worm rotates, and the screw rod is driven to ascend and descend in the vertical direction through the rotation of the worm gear. The lifting mechanism can meet the vertical lifting adjustment requirements of high precision and large load at the same time in a limited space. In addition, an anti-rotation limiting mechanism is further adopted in the lifting mechanism, so that the screw rod is prevented from rotating, then the output of the worm gear and the worm can be completely received by the screw rod, meanwhile, the movement range of thescrew rod is limited, and then a whole transmission mechanism has higher efficiency and reliability. In addition, the lifting mechanism makes up the vacancy of high-precision, large-load and small-size lifting mechanisms in the prior art, is applied to the fields such as the photoetching machine and can also correspondingly improve the photoetching effect of the photoetching machine.

Description

technical field [0001] The invention relates to a lifting mechanism, in particular to a lifting mechanism, a lifting platform device, a photolithography machine and a photolithography method. Background technique [0002] The lifting mechanism is a common mechanism that can be used to lift people or goods to a certain height and can be used in many fields. For example, in the field of semiconductor manufacturing, the lifting mechanism is applied to the workpiece table of the lithography machine. The base frame of the workpiece table can be used to support and adjust the entire magnetic levitation table module. [0003] However, due to the size limitation of the front-end lithography machine, the installation position and space of the lifting mechanism are very limited. Under this premise, the requirements for its adjustment accuracy, stability and reliability are also very high. At the same time, it is also required that the lifting mechanism can withstand a large load of, ...

AI Technical Summary

Problems solved by technology

At present, all the lifting table systems found on the market cannot meet the needs and are far from each other

And, the inventor consulted a number of well-known lifting platform manufacturing companies that can provide customized lifting platform services, and was told that it is impossible to manufacture a suitable lifting platform system that satisfies the working conditions of high precision, large load and small size at the same time

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