Sequential infiltration synthesis apparatus
A technology for synthesizing equipment and equipment, applied in the direction of optomechanical equipment, instruments, coatings, etc., can solve the problems of low etching resistance, difficult transfer, etc., and achieve the effect of increasing throughput
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[0032] While certain embodiments and examples are disclosed below, those skilled in the art will appreciate that the invention extends beyond the specifically disclosed embodiments and / or uses of the invention as well as obvious modifications and equivalents thereof. Therefore, it is intended that the scope of the present disclosure should not be limited by the specific disclosed embodiments described below.
[0033] figure 1 Depicted is a sequential osmosis synthesis apparatus according to an embodiment. The apparatus comprises a reaction chamber 2 made of a suitable material such as steel, aluminum or quartz. A substrate 12 topped with a permeable material can be placed on a substrate holder 10 in the reaction chamber 2 via a substrate opening (not shown) by a substrate handler. The reaction chamber 2 forms a chamber closed at one end by a flange through which gas is introduced via one or more openings provided with at least one (distribution) reaction chamber valve 19 for...
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