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Display backplane and manufacturing method thereof

A display backplane and manufacturing method technology, applied in semiconductor/solid-state device manufacturing, electrical components, electric solid-state devices, etc., can solve problems affecting display backplanes, reduce parasitic capacitive coupling, avoid internal light reflection, increase Effect of Pixel Light-emitting Area and Aperture Ratio

Active Publication Date: 2021-11-23
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] At present, the light-shielding metal layer of the display backplane can block part of the incident light, but there are still internal reflections that affect the display backplane

Method used

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  • Display backplane and manufacturing method thereof
  • Display backplane and manufacturing method thereof

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Embodiment Construction

[0019] In order to make the above and other objectives, features, and advantages of the present disclosure more comprehensible, preferred embodiments of the present disclosure will be exemplified below in detail with reference to the attached drawings. Furthermore, the direction terms mentioned in this disclosure, such as up, down, top, bottom, front, back, left, right, inside, outside, side layer, surrounding, center, horizontal, transverse, vertical, longitudinal, axial , radial direction, the uppermost layer or the lowermost layer, etc., are only directions for referring to the attached drawings. Therefore, the directional terms used are used to explain and understand the present disclosure, but not to limit the present disclosure.

[0020] In the figures, structurally similar units are denoted by the same reference numerals.

[0021] refer to figure 1 , an embodiment of the present disclosure provides a method 100 for manufacturing a display backplane, including the foll...

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Abstract

The disclosure provides a display backplane and a method of making the same. The manufacturing method of the display backplane includes providing a substrate, forming a transparent metal layer on the substrate, forming a black matrix photoresist layer on the transparent metal layer, and patterning the black matrix photoresist layer to partially cover the For the transparent metal layer, a buffer layer is formed on the substrate, the transparent metal layer and the black matrix photoresist layer, and a transparent oxide semiconductor layer is formed on the buffer layer. The area where the transparent metal layer is covered by the black matrix photoresist layer is defined as a driving thin film transistor area, and the area where the transparent metal layer is not covered by the black matrix photoresist layer is defined as a storage capacitor area. The disclosure can avoid the internal light reflection of the display backplane and improve the aperture ratio.

Description

【Technical field】 [0001] The disclosure relates to the field of display technology, in particular to a display backplane and a manufacturing method thereof. 【Background technique】 [0002] At present, the light-shielding metal layer of the display backplane can block part of the incident light, but the internal reflection light still affects the display backplane. In addition, since the electrodes of the storage capacitors are made of metal, the pixel light-emitting area and aperture ratio of the display backplane are reduced. [0003] Therefore, there is a need to provide a display backplane and a manufacturing method thereof to solve the problems existing in the prior art. 【Content of invention】 [0004] In order to solve the above technical problems, an object of the present disclosure is to provide a display backplane and a manufacturing method thereof, which can avoid internal light reflection of the display backplane and increase aperture ratio. [0005] To achieve...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/84H01L27/12H01L23/64
CPCH01L27/1218H01L27/1255H01L27/1262H01L27/1288H01L27/1296H01L28/60
Inventor 余明爵任章淳
Owner SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD