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Transfer device, transfer chamber and method for preventing corrosion of manipulator

A transmission device and manipulator technology, applied in the direction of conveyor objects, transportation and packaging, electrical components, etc., can solve problems affecting product quality, metal pollution in the process chain, etc., achieve low cost, reduce maintenance costs, and facilitate transformation.

Active Publication Date: 2021-08-13
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, for the integrated circuit industry, excess metal may cause metal contamination throughout the process chain, thereby affecting product quality

Method used

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  • Transfer device, transfer chamber and method for preventing corrosion of manipulator
  • Transfer device, transfer chamber and method for preventing corrosion of manipulator
  • Transfer device, transfer chamber and method for preventing corrosion of manipulator

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Embodiment Construction

[0033] In order for those skilled in the art to better understand the technical solution of the present invention, the transmission device, the transmission chamber and the method for preventing corrosion of the manipulator provided by the present invention will be described in detail below with reference to the accompanying drawings.

[0034] This embodiment provides a transfer device, which includes a manipulator and a conveying air path, the manipulator is used to transfer wafers, and the gas outlet end of the conveying air path is arranged on the outer surface of the manipulator, or is located near the manipulator to pass the output The shielding gas forms a gas shield around the manipulator. Wherein, the manipulator may be one component or multiple components in the transmission chamber, which can be specifically set according to the equipment conditions of the transmission chamber, which is not specifically limited in this embodiment.

[0035] The transport device provid...

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Abstract

The invention provides a transmission device, a transmission chamber and a method for preventing corrosion of a manipulator. The transmission device includes a conveying gas path, and the gas outlet end of the conveying gas path is arranged on the outer surface of the manipulator in the transmission chamber, or is located near the manipulator, so as to pass through the output of the protective gas and protect the air around the manipulator. Form a gas shield. The invention can effectively prevent corrosion of the manipulator in the transmission chamber, so that some key parts can be changed from consumable parts to long-term use parts, without regular replacement, and the maintenance cost of the machine is reduced. In addition, the addition of a conveying gas path will basically not affect the normal use of the machine, and the transformation of the existing machine is more convenient and the cost is lower.

Description

technical field [0001] The invention relates to the field of integrated circuit manufacturing, in particular to a transmission device, a transmission chamber and a method for preventing corrosion of a manipulator. Background technique [0002] In the manufacturing process of integrated circuits, wafers need to go through multiple processes and need to be circulated in different chambers. Among them, the transfer chamber is mainly used to transfer the wafer to the process chamber for process reaction, and after the process Transfer wafers to other process chambers or load chambers. When the wafer is transferred from one chamber to another connected chamber, the product in the previous chamber or the gas remaining on the wafer surface and participating in the process reaction will be transferred to the wafer as the manipulator diffuses. in the chamber. Especially when picking and placing wafers manually, you need to open the chamber cover every time you take the wafers, so t...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/67H01L21/677
CPCH01L21/67196H01L21/67739
Inventor 宋智燕
Owner BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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