A polishing liquid circulating purification treatment device

Abstract

The invention discloses a polishing liquid circulation purification treatment device, which comprises a box body, a polishing liquid liquid storage tank is provided at the bottom of one side of the case body, and a polishing liquid separation device is provided at the top of the polishing liquid liquid storage tank. The polishing liquid storage tank is equipped with a polishing liquid stirring device, the bottom of the other side of the box is provided with a polishing liquid proportioning stirring device, and above the polishing liquid proportioning stirring device is provided with a polishing liquid sedimentation secondary separation The device; the polishing liquid separation device includes a drum, a drum driving motor and a lifting mechanism; the drum includes an inner cylinder and an outer cylinder. The waste polishing fluid produces three-level stratification in the cooperation of the polishing fluid separation device and the polishing fluid storage tank, and the high-speed rotating polishing fluid can be separated according to the different abrasive particle concentrations in the polishing fluid, and the unqualified The polishing solution is separated for the second time, and the abrasive grains that meet the requirements are directly output for polishing, which greatly improves the separation efficiency.

Description

technical field [0001] The invention relates to a polishing liquid processing device, in particular to a polishing liquid circulating purification processing device. Background technique [0002] At present, with the development of science and technology and the upgrading of the industry chain, the processing standards in various fields of society continue to rise, and the demand for smooth or ultra-smooth surface components is increasing. In the standards of the optical field, the surface accuracy of complex curved surface components is required to be within a few tenths of a wavelength, and the surface roughness is required to be below 5 nanometers. It is an important research direction to control the factors that affect the polishing quality in each link during the polishing process, so as to improve the precision of the polished workpiece surface and reduce the surface roughness. However, during the polishing process, the core material polishing liquid requires a large ...

AI Technical Summary

Problems solved by technology

If the polishing liquid is not replaced in time, the material particles on the surface of the workpiece mixed in the polishing liquid will enter the polishing particles and enter the micro-cutting scratches on the surface of the workpiece, thereby weakening the cutting effect of the polishing particles and reducing the processing efficiency. Scratches on the polishing surface or uneven polishing removal degree caused by agglomeration or uneven dispersion of polishing particles

Although this kind of phenomenon may be eliminated in the subsequent polishing process, it will greatly increase the polishing time and the amount of polishing liquid used, which will increase the production cost of the product and reduce the overall surface quality

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