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A pixel structure, image sensor and terminal

A technology of pixel structure and photosensitive area, which is applied in the image field, can solve the problems of limiting the photosensitive range of pixels and the limitation of full well capacity, and achieve the effect of large full well capacity and enlarged volume

Active Publication Date: 2021-11-16
GUANGDONG OPPO MOBILE TELECOMM CORP LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] The maximum amount of charge that can be accumulated by the capacitance of the photosensitive element photodiode (Photo-Diode, PD) in the pixel structure is called the full well capacity. In the existing pixel structure, the electrode of the TG needs to occupy the spatial position of the PD, so that the full well of the PD Capacities are limited, which limits the range of light-sensing pixels

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  • A pixel structure, image sensor and terminal
  • A pixel structure, image sensor and terminal
  • A pixel structure, image sensor and terminal

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Embodiment Construction

[0025] In order to understand the characteristics and technical contents of the embodiments of the present application in more detail, the implementation of the embodiments of the present application will be described in detail below in conjunction with the accompanying drawings. The attached drawings are only for reference and description, and are not intended to limit the embodiments of the present application.

[0026] In practical applications, the pixel structure, as an important part of the image sensor, can complete the photoelectric conversion of the received natural light to obtain electrical signals. However, when the pixel size of the pixel structure is about 600nm, the photoelectric conversion unit has a higher Quantum efficiency, as the size of the pixel structure decreases, the area of ​​the photosensitive region of the photoelectric conversion unit also decreases, thereby reducing the quantum efficiency of the photoelectric conversion unit and affecting the imagin...

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Abstract

The embodiment of the present application discloses a pixel structure, an image sensor, and a terminal, including: at least one photoelectric conversion unit, at least one transfer transistor, and a readout circuit; the source of the transfer transistor is connected to the photoelectric conversion unit, and the drain of the transfer transistor is connected to the To the readout circuit, the gate of the transfer transistor is used to receive the transfer control signal; the drain and the gate are located at the first section of the pixel structure, and the source is located at the second section of the pixel structure; the photoelectric conversion unit is used to absorb specific wavelength The optical signal converts the absorbed optical signal into an electrical signal; among them, the optical signals of specific wavelengths that can be absorbed by the photoelectric conversion units with different photosensitive area sizes are different; the transmission transistor is used to transmit the electrical signal of the photoelectric conversion unit to the reader. out of the circuit. In this way, the size of the photoelectric conversion unit along the cross-sectional direction can be as close as possible to the cross-sectional size of the pixel structure, which enlarges the volume of the photoelectric conversion unit, thereby obtaining a larger full well capacity.

Description

technical field [0001] The present application relates to image technology, and in particular to a pixel structure, an image sensor and a terminal. Background technique [0002] Complementary Metal Oxide Semiconductor (CMOS) image sensors are widely used in photography and camera products because of their low manufacturing cost and low power consumption. For CMOS image sensors, higher sensitivity, shorter exposure time and The shrinking pixel size has become a development trend of CMOS image sensors. [0003] A CMOS transmission gate (Transmission Gate, TG) is a controllable switch circuit that can transmit both digital and analog signals. The CMOS transmission gate is composed of a PMOS and an NMOS transistor connected in parallel, which has a very low on-resistance (hundreds of ohms) and a high off-resistance (greater than 10^9 ohms). [0004] The maximum amount of charge that can be accumulated by the capacitance of the photosensitive element photodiode (Photo-Diode, PD...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H04N5/374H04N5/378
CPCH04N25/76H04N25/75
Inventor 杨鑫
Owner GUANGDONG OPPO MOBILE TELECOMM CORP LTD