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Substrate processing equipment

A substrate processing device and substrate technology, which is applied in the direction of dry goods processing, dry gas arrangement, progressive dryer, etc., can solve the problems of lower substrate surface treatment yield and other issues

Active Publication Date: 2020-10-27
DMS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0011] However, since the surface treatment process is carried out by the ultraviolet irradiation device in the state where the substrate remains foggy, there is a problem that the yield of the surface treatment of the substrate decreases.

Method used

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  • Substrate processing equipment
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Embodiment Construction

[0034] Hereinafter, description will be made with reference to the accompanying drawings of preferred embodiments of the present invention, which can specifically solve the above-mentioned problems. In describing the present embodiment, the same names and the same symbols are used for the same structures, and additional descriptions thereof will be omitted hereinafter.

[0035] figure 1 is a side view schematically showing the structure of the substrate processing apparatus according to the present invention, figure 2 It is a perspective view showing a part of the lamp assembly and the gas supply and discharge device of the substrate processing apparatus according to the present invention. in, figure 1 The arrows shown represent the flow of gas supplied and exhausted for substrate processing.

[0036] in addition, image 3 is a cross-sectional view schematically showing the structure of a lamp assembly and a gas supply and discharge device according to the present inventi...

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Abstract

The present invention relates to a substrate processing apparatus, which can dry a substrate by irradiating ultraviolet rays and process a surface of the substrate so that the surface of the substrate has hydrophilic property. The present invention provides a substrate processing apparatus, which includes: a lamp assembly having an ultraviolet lamp irradiating ultraviolet rays to a substrate transferred by a transfer means and a reflecting shade provided on an upper side of the ultraviolet lamp and reflecting the ultraviolet rays irradiated from the ultraviolet lamp toward the substrate; a gas supply means installed on an upper side of the substrate, supplying gas to an upper surface of the substrate, and discharging fluid moved along the upper surface of the substrate; and a housing having a receiving space in which the gas heated by the ultraviolet lamp is received.

Description

technical field [0001] The present invention relates to a substrate processing apparatus, and more particularly, to a substrate processing apparatus capable of performing a process of making the surface of the substrate hydrophilic by irradiating the substrate to dry the substrate. Background technique [0002] Generally, a substrate drying apparatus for large-area substrates has an air knife and an exhaust structure. The air knives are respectively arranged on the upper and lower sides of the conveyed substrate to spray drying air. discharged to the outside. [0003] The conventional exhaust structure uses the exhaust fan installed in the lower part of the drying chamber to exhaust the air together. [0004] A conventional substrate drying apparatus includes a drying chamber, an upper air knife and a lower air knife, which are provided inside the drying chamber and are located on the upper and lower sides of the conveyed substrate, respectively, and spray drying air on the...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): F26B15/12F26B21/00F26B25/00
CPCF26B15/12F26B21/001F26B21/004F26B25/003
Inventor 朴庸硕
Owner DMS CO LTD