Displacement measurement system and photoetching machine

Abstract

The invention provides a displacement measurement system, which is used for measuring the displacement information of a first motion platform moving along a predetermined direction, and comprises a second motion platform moving parallel to the predetermined direction; a laser interferometer measuring device which is used for measuring the displacement information of the second moving table movingalong a preset direction; a displacement conversion device which is used for amplifying the movement of the second moving table along the preset direction according to a preset proportion and drivingthe first moving table to move along the preset direction; a control device which is used for amplifying the displacement information of the second moving table moving along the preset direction intothe displacement information of the first moving table moving along the preset direction according to a preset proportion, wherein the first moving table, the second moving table and the laser interferometer measuring device are sequentially distributed along the preset direction. According to the displacement measurement system and the photoetching machine, the measurement precision and stabilityof the displacement measurement system can be improved.

Description

technical field [0001] The invention relates to the technical field of position measurement, in particular to a displacement measurement system and a photolithography machine. Background technique [0002] Laser interferometry linear displacement technology is a standard measurement technology with high precision, which is widely used in precision and ultra-precision machining, microelectronic equipment, nanotechnology industrial equipment and national defense equipment and other fields. figure 1 is a schematic diagram of a displacement measurement system such as figure 1 As shown, the displacement measurement system is used to measure the displacement information of the moving platform, and the displacement measurement system includes a laser interferometer 110 . The moving table 120 is provided with a reflector 130 capable of reflecting the measurement beam 140 emitted by the laser interferometer 110 . The measuring beam 140 of the laser interferometer 110 is reflected f...

AI Technical Summary

Problems solved by technology

[0005] In the current technology, in order to improve the problem of poor measurement accuracy and stability of the laser interferometer affected by the environment, it is mainly by improving the stability of the environment during the laser interferometer measurement beam propagation process, or by measuring the measurement beam propagation process. The actual value of the refractive index of air compensates the wavelength of the measurement beam in real time to improve the measurement accuracy and stability of the laser interferometer

Compensate the wavelength of the measurement beam. In this way, more sensors need to be installed to measure the temperature and pressure of the environment during the propagation of the measurement beam. The number and installation position of the sensors will be restricted by the overall layout of the displacement measurement system, and the moving stage It is moving during the measurement process, and the number and position of the sensor cannot change with the length of the measurement optical path. The measured value of the sensor cannot reflect the actual temperature and pressure of the environment during the propagation of the measurement beam, thus resulting in the measurement of the beam. Inaccurate wavelength compensation, which eventually leads to reduced measurement accuracy and stability of the laser interferometer

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