A kind of preparation method of one-step chemical vapor deposition lead-free all-inorganic perovskite film
A chemical vapor deposition, inorganic calcium technology, applied in electrical components, semiconductor/solid-state device manufacturing, circuits, etc., can solve the problems of low perovskite purity and low controllability, and achieve good repeatability and simple process. , high-quality effects
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Embodiment 1
[0029] 1) Put cesium bromide and tin bromide powder into quartz boats according to the same molar ratio of 0.1mol:0.1mol, and then put the quartz boats into a tube furnace with a diameter of 20mm and a length of 1000mm. In the high temperature zone of the glass tube;
[0030] 2) The single crystal silicon substrate was ultrasonically cleaned in acetone, absolute ethanol and deionized water for 15 minutes, then dried in a drying oven, and placed on a semicircular base, where the inclination angle of the base was 45 degrees, Place the base in the low temperature area downstream of the quartz tube;
[0031] 3) After sealing the tube furnace, flow a high-purity inert gas with a flow rate of 400 sccm for 5 minutes, then adjust the flow rate of the high-purity inert gas to 200 sccm, and start the heating program.
[0032] 4) Raise the high temperature zone from room temperature to 860°C in 90 minutes and keep it for 5 minutes; then raise the temperature in the low temperature zone ...
Embodiment 2
[0037] 1) Put cesium bromide and tin bromide powder into quartz boats according to the same molar ratio of 0.1mol:0.1mol, and then put the quartz boats into a tube furnace with a diameter of 20mm and a length of 430mm. In the high temperature zone of the glass tube;
[0038] 2) The single crystal silicon substrate was ultrasonically cleaned in acetone, absolute ethanol and deionized water for 15 minutes, then dried in a drying oven, and placed on a semicircular base, where the inclination angle of the base was 90 degrees, Place the base in the low temperature area downstream of the quartz tube;
[0039] 3) After sealing the tube furnace, flow a high-purity inert gas with a flow rate of 400 sccm for 5 minutes, then adjust the flow rate of the high-purity inert gas to 300 sccm, and start the heating program.
[0040] 4) Raise the high temperature zone from room temperature to 600°C in 90 minutes and keep it for 5 minutes; then raise the temperature in the low temperature zone f...
Embodiment 3
[0042] 1) Put cesium bromide and tin bromide powder into quartz boats according to the same molar ratio of 0.1mol:0.1mol, and then put the quartz boats into a tube furnace with a diameter of 20mm and a length of 1000mm. In the high temperature zone of the glass tube;
[0043] 2) The single crystal silicon substrate was ultrasonically cleaned in acetone, absolute ethanol and deionized water for 15 minutes, then dried in a drying oven, and placed on a semicircular base, where the inclination angle of the base was 45 degrees, Place the base in the low temperature area downstream of the quartz tube;
[0044]3) After sealing the tube furnace, flow a high-purity inert gas with a flow rate of 400 sccm for 5 minutes, then adjust the flow rate of the high-purity inert gas to 200 sccm, and start the heating program.
[0045] 4) The high temperature zone is raised from room temperature to 900°C within 90 minutes and kept for 5 minutes; then the low temperature zone is raised from room t...
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