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Simulation analysis method of composite conductive film, electronic equipment thereof and storage medium

A technology of composite conductive film and simulation analysis, which is applied in the field of simulation calculation of spaceborne microwave semiconductor devices, can solve the problem of low accuracy of simulation results, difficulty in accurately simulating physical field effects, high dielectric constant substrates and composite conductive films Layer synchronization modeling and other issues to achieve high accuracy

Active Publication Date: 2020-01-24
XIDIAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] The traditional simulation analysis method does not model the high dielectric constant substrate and the composite conductive film layer simultaneously, so it does not take into account the interaction force between the bottom of the composite conductive film layer and the high dielectric constant substrate, so it is difficult to accurately simulate the composite conductive film layer. The physical field effect after the layer is energized and the force of the composite conductive film layer relative to the high dielectric constant substrate, so the accuracy of the simulation results is not high

Method used

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  • Simulation analysis method of composite conductive film, electronic equipment thereof and storage medium
  • Simulation analysis method of composite conductive film, electronic equipment thereof and storage medium
  • Simulation analysis method of composite conductive film, electronic equipment thereof and storage medium

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Embodiment 1

[0059] See figure 1 , figure 1 It is a schematic flowchart of a simulation analysis method for a composite conductive film provided by an embodiment of the present invention. The embodiment of the present invention provides a simulation analysis method of a composite conductive film, the method comprising the following steps:

[0060] Step 1, respectively modeling the high dielectric constant substrate and the composite conductive film layer to obtain the geometric model of the high dielectric constant substrate and the geometric model of the composite conductive film layer;

[0061] Step 2. Set up material modules for the geometric model of the high dielectric constant substrate and the geometric model of the composite conductive film layer, and set several physics interface modules for the geometric model of the high dielectric constant substrate and the geometric model of the composite conductive film layer, and set Boundary conditions are set for each physics interface m...

Embodiment 2

[0149] On the basis of the first embodiment above, please refer to Figure 14 , Figure 14 It is a schematic structural diagram of an electronic device for simulation analysis of a composite conductive film provided by an embodiment of the present invention. This embodiment provides an electronic device for simulation analysis of a composite conductive film. The electronic device includes a processor, a communication interface, a memory, and a communication bus, wherein the processor, the communication interface, and the memory complete communication with each other through the communication bus;

[0150] memory for storing computer programs;

[0151] When the processor is used to execute the computer program stored on the memory, when the computer program is executed by the processor, the following steps are implemented:

[0152] Step 1. Modeling the high dielectric constant substrate and the composite conductive film layer respectively to obtain the geometric model of the ...

Embodiment 3

[0161] On the basis of the second embodiment above, please refer to Figure 15 , Figure 15 It is a schematic structural diagram of a computer-readable storage medium provided by an embodiment of the present invention. A computer-readable storage medium provided by this embodiment has a computer program stored thereon, and the above-mentioned computer program implements the following steps when executed by a processor:

[0162] Step 1. Modeling the high dielectric constant substrate and the composite conductive film layer respectively to obtain the geometric model of the high dielectric constant substrate and the composite conductive film layer.

[0163] Specifically, this embodiment includes performing three-dimensional geometric modeling on the high-permittivity substrate according to the internal structure and geometric dimensions of the high-permittivity substrate to obtain a high-permittivity substrate geometric model; The composite conductive film layer is subjected to...

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Abstract

The invention discloses a simulation analysis method of a composite conductive film, electronic equipment thereof and a storage medium. The simulation analysis method comprises the following steps: modeling a high-dielectric-constant substrate and a composite conductive film layer to obtain a high-dielectric-constant substrate geometric model and a composite conductive film layer geometric model;setting a material module and a plurality of physical field interface modules for the geometric model of the high dielectric constant substrate and the geometric model of the composite conductive filmlayer, and setting boundary conditions for each physical field interface module to obtain a composite conductive film model based on the high dielectric constant substrate; and establishing a finiteelement mesh model on the composite conductive film model based on the high dielectric constant substrate, and calculating the finite element mesh model to obtain a simulation result. According to thesimulation analysis method, the high-dielectric-constant substrate and the composite conductive film layer are synchronously modeled, and the interaction between the high-dielectric-constant substrate and the composite conductive film layer is considered, so that the shedding condition of the composite conductive film layer on the high-dielectric-constant substrate is evaluated, and the simulation model is closer to the actual condition, and the simulation result is high in accuracy.

Description

[0001] technology neighborhood [0002] The invention belongs to the technical field of simulation calculation of satellite-borne microwave semiconductor devices, and in particular relates to a simulation analysis method of a composite conductive film, electronic equipment, and a storage medium. Background technique [0003] With the continuous development of space-borne microwave products in the direction of high density and high integration, the original solid-lay manufacturing mode based on alumina ceramic substrate and HMIC technology can no longer meet the needs of miniaturization and light weight. Therefore, it is urgent to find a A reliable way to significantly improve the miniaturization level of matching in high-power solid-discharge circuits. [0004] Traditional simulation analysis methods include finite element analysis (Finite Element Analysis, FEA for short), and finite element analysis methods generally only model and simulate composite conductive film layers or...

Claims

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Application Information

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IPC IPC(8): G06F30/23
Inventor 柴常春靳文轩李赟王平张楠白浩
Owner XIDIAN UNIV