Turning device and vacuum coating equipment
A flipping device and flipping frame technology, applied in vacuum evaporation coating, sputtering coating, gaseous chemical plating, etc., can solve problems such as substrate dropping, affecting production cycle and product quality, and substrate surface damage , to avoid surface damage or drop, improve production efficiency and product quality, improve reliability and stability
Active Publication Date: 2021-08-06
北京七星华创集成电路装备有限公司
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Problems solved by technology
[0003] However, the surface of the substrate is often damaged or even dropped during the flipping process of the existing turning mechanism, which seriously affects the production cycle and product quality
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[0041] In order to enable those skilled in the art to better understand the technical solutions of the present invention, the inversion device and vacuum coating equipment provided by the present invention will be described in detail below with reference to the accompanying drawings.
[0042] Please also refer to Figure 1 to Figure 6 , the overturning device provided by the present embodiment, which includes a reversible overturning frame 1, two first clamping mechanisms 3 oppositely arranged on the overturning frame 1, and two first clamping mechanisms 3 connected to the two first clamping mechanisms 3 respectively. The stage assembly and two second clamping mechanisms 4 respectively arranged on the two stage assemblies.
[0043] In this embodiment, the two stage assemblies both include a stage 2 , and the stages 2 of the two stage assemblies are oppositely arranged, and the two surfaces opposite to each other are carrying surfaces for carrying the tray 10 .
[0044] The tw...
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The invention provides an overturning device and vacuum coating equipment. The overturning device comprises a reversible overturning frame, two first clamping mechanisms arranged oppositely on the overturning frame, and two first clamping mechanisms respectively connected with the two first clamping mechanisms. a stage assembly and two second clamping mechanisms respectively arranged on the two stage assemblies, wherein each stage assembly is used to carry a tray; the two first clamping mechanisms are used to provide support to the two stage assemblies Apply pressure to the surrounding edges of the two carrier assemblies to clamp the two pallets placed between the two carrier assemblies; two second clamping mechanisms are used to specify the two trays placed on the two carrier assemblies The pressure is applied at the designated position corresponding to the substrate on the tray. The overturning device provided by the invention can prevent the surface of the substrate from being damaged or dropped during the overturning process, and improve the reliability and stability of overturning and clamping, thereby improving production efficiency and product quality.
Description
technical field [0001] The invention relates to the technical field of semiconductor processing, in particular to a turning device and vacuum coating equipment. Background technique [0002] In the field of rare earth magnetic material production, it is necessary to use a vacuum coating production line to deposit the surface of the NdFeB substrate. During the process, the NdFeB substrate is evenly placed on the tray, and the tray is sequentially entered into the process chamber of the production line for coating. According to the process requirements, after one side of the substrate is coated, the substrate needs to be turned over for convenience. Coat the other side of the substrate. In order to realize efficient automatic production, it is necessary to set up a turning device outside the process chamber. The turning device realizes turning over the substrate between the two trays by clamping and fixing two trays and turning them over. [0003] However, the surface of the...
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IPC IPC(8): C23C14/50C23C16/458
CPCC23C14/50C23C16/4582
Inventor 金晨杨卓李建银
Owner 北京七星华创集成电路装备有限公司