Gas suspension device in vapor deposition furnace

Abstract

The invention provides a gas suspension device in a vapor deposition furnace. The gas suspension device comprises a graphite disc and a base which are arranged in parallel and are rotationally matched. A main air inlet hole, a first air distribution hole, a second air distribution hole, a first inclined air outlet hole and a second inclined air outlet hole are formed in the base. The first air distribution hole and the second air distribution hole are located in the two sides of the main air inlet hole and are intersected and communicate with the main air inlet hole at the same point. The gassuspension device has the beneficial effects that the first air distribution hole and the second air distribution hole are separated at the same position of the main air inlet hole, then rotating gases are generated through the first inclined air outlet hole and the second inclined air outlet hole, the graphite disc is pushed to suspend and rotate, it is ensured that the gas flowing resistance isconsistent, it is ensured that the flow of the two inclined gases is the same, the suspension effect is good, rotating is smooth, the uniformity and quality of films can be obviously improved, and theservice cycle of the device is effectively prolonged.

Description

technical field [0001] The invention relates to a vapor deposition furnace, in particular to a gas suspension device in a vapor deposition furnace. Background technique [0002] The fundamentals of vapor deposition involve reaction chemistry, thermodynamics, kinetics, transfer mechanisms, film growth phenomena, and reaction engineering. Mainly use vapor such as metal vapor, volatile metal halide, hydride or metal organic compound as raw material, carry out gas phase thermal decomposition reaction, and the reaction of two or more simple substances or compounds, and then condense to form materials in various forms. In the chemical vapor deposition process, the uniformity of the deposited film is extremely important, and the uniformity of the film is mainly affected by the gas distribution in the furnace. The chemical vapor deposition process is an extremely complex chemical process. Whether the gas is evenly distributed will have a great impact on the deposition rate of the p...

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Problems solved by technology

[0003] The graphite disk rotating device in the prior art usually includes a graphite disk and a base. The main air passage in the base is directly connected with two inclined air holes for generating rotating gas to push the graphite disk to suspend and rotate. One of the inclined air holes is in the front and the other is in the rear. The resistance flowing through the front pores is smaller than that of the rear pores, so more gas flows through the front pores, and the front pores are also corroded by the process gas, resulting in the increase of the front pores and affecting the uniformity of the gas flow, which is easy to affect the graphite. Normal levitation and rotation of the disc, causing the device to fail

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