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Light generation system using metal-nonmetal compound as precursor and related light generation method

A non-metal, compound technology, applied in the field of light generation systems, can solve problems such as increasing the complexity of IC processing and manufacturing

Inactive Publication Date: 2020-02-11
TAIWAN SEMICON MFG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

This scaling down increases the complexity of IC processing and manufacturing

Method used

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  • Light generation system using metal-nonmetal compound as precursor and related light generation method
  • Light generation system using metal-nonmetal compound as precursor and related light generation method
  • Light generation system using metal-nonmetal compound as precursor and related light generation method

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Embodiment Construction

[0017] The following disclosure provides many different embodiments, or examples, for implementing different features of the presented subject matter. Specific examples of components and arrangements are described below to simplify the present disclosure. Of course, these are examples only and are not intended to be limiting. For example, in the following description, the formation of a first feature on or over a second feature may include embodiments in which the first feature is formed in direct contact with the second feature, and may also include embodiments in which additional features may be formed on the first feature. Embodiments between a feature and a second feature such that the first feature and the second feature may not be in direct contact. Additionally, the present disclosure may repeat reference numerals and / or letters in various instances. This repetition is for simplicity and clarity and does not in itself indicate a relationship between the various embodi...

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Abstract

The embodiment of the invention relates to a light generation system using metal-nonmetal compound as a precursor and a related light generation method. A light generation system is provided. The light generation system includes a vaporization device, a laser device and a lens structure. The vaporization device is configured to vaporize a metal-nonmetal compound to generate a metal-nonmetal precursor gas. The laser device is configured to provide laser light, and irradiate the metal-nonmetal precursor gas released from the vaporization device with the laser light to emit a light signal. The lens structure is configured to direct the light signal toward a photomask used in a lithography process.

Description

technical field [0001] Embodiments of the present invention relate to a light generation system using a metal-nonmetal compound as a precursor and a related light generation method. Background technique [0002] Technological advances in integrated circuit (IC) materials and design have produced many generations of ICs, each with smaller and more complex circuits than the previous generation. In the course of IC evolution, while the smallest component or line that can be created using a fabrication process has decreased, the number of interconnected elements per chip area has generally increased. This scaling down increases the complexity of IC processing and manufacturing. With these advances to be realized, the need to perform higher resolution photolithography processes grows. Since extreme ultraviolet (EUV) beams have extremely short wavelengths, EUV lithography is considered a next-generation technology that allows exposure of relatively fine circuit patterns. Conte...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/70025H05G2/003H05G2/006H05G2/008H05G2/005
Inventor 许青翔徐丰源张旭凯杨棋铭
Owner TAIWAN SEMICON MFG CO LTD