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Treatment method and cleaning method for metal oxyfluorides

By converting metal oxyfluoride into contact with fluorine-containing gas into metal hexafluoride, the problem of removing metal oxyfluoride deposits in the existing technology is solved, and an efficient and low-cost dry cleaning method is achieved, which is suitable for industrial scale chemical vapor deposition equipment.

Active Publication Date: 2020-02-14
CENT GLASS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0028] Metal oxyfluoride has a high boiling point and melting point, and is a solid at normal temperature and pressure, so it is easy to precipitate into a white solid in the device, which becomes the cause of malfunctions such as blockage of the device and piping.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0083] To volume 100cm 3 The container 103 is filled with 33 g of tungsten oxyfluoride as metal oxyfluoride 105 . Nitrogen gas was supplied from the inert gas supply unit 102 and replaced by vacuum degassing by the gas discharge device 104 . Fluorine gas is introduced from the fluorine-containing gas supply unit 101 until the absolute pressure becomes 100 kPa on a pressure gauge (not shown), and brought into contact with the metal oxyfluoride 105 . The molar ratio of the metal oxyfluoride to the fluorine-containing gas was set to 30. The container 103 was set at 20°C by the heater 106, and after standing for 2 hours, a part of the gas in the reactor 103 was extracted, and the concentration of tungsten hexafluoride was measured by an infrared spectrophotometer, and the conversion rate of the fluorine-containing gas was calculated. The conversion rate represents the ratio of fluorine gas consumed by conversion of tungsten hexafluoride within a reaction time of 2 hours among th...

Embodiment 2

[0085] The fluorine-containing gas was brought into contact with the metal oxyfluoride in the same manner as in Example 1 except that the fluorine-containing gas was nitrogen trifluoride. As a result, the conversion rate of nitrogen trifluoride was 1%.

Embodiment 3

[0087] The fluorine-containing gas was brought into contact with the metal oxyfluoride in the same manner as in Example 1 except that the fluorine-containing gas was used as chlorine trifluoride. As a result, the conversion rate of chlorine trifluoride was 53%.

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PUM

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Abstract

The treatment method for metal oxyfluorides is characterized in that a metal oxyfluoride represented by the general formula MO(6-x) / 2Fx (0<x6, M=W or Mo) is brought into contact with a fluorine-containing gas at a temperature of 0 degrees centigrade to less than 400 degrees centigrade to convert the same to a metal hexafluoride represented by the general formula MF6 (M=W or Mo) by a chemical reaction. In the treatment method, it is possible to convert the metal oxyfluoride to a high vapor pressure substance without using a plasma-generating device and the method can be used for cleaning metalfluoride production apparatuses and cleaning film-forming apparatuses.

Description

technical field [0001] The present invention relates to making metal oxyfluoride MO (6-x) / 2 f x (0<x<6, M=W or Mo) chemically reacts with fluorine-containing gas to convert to MF 6 A treatment method and a cleaning method using the treatment method to remove metal oxyfluorides (metal oxyfluorides) deposits and the like. Background technique [0002] Tungsten hexafluoride or molybdenum hexafluoride are known as precursors for chemical vapor deposition of tungsten (W), tungsten compounds, molybdenum (Mo) or molybdenum compounds. As the industrial production method of these precursors, it is known to make metal tungsten and fluorine or trifluoro Nitrogen, the method of contacting metal molybdenum with fluorine or nitrogen trifluoride. [0003] W(s)+3F 2 (g)→WF 6 (g) Reaction formula (1-1) [0004] W(s)+2NF 3 (g)→WF 6 (g)+N 2 (g) Reaction formula (1-2) [0005] Mo(s)+3F 2 (g)→MoF 6 (g) Reaction formula (2-1) [0006] Mo(s)+2NF 3 (g)→MoF 6 (g)+N 2 (g) React...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/44C01G39/04C01G41/04H01L21/28H01L21/285H01L21/302H01L21/3065
CPCC01G39/04C01G41/04H01L21/3065H01L21/28H01L21/285H01L21/302C01G1/06C23C16/4405C23C16/14Y02P70/50B08B5/00B08B7/0071B08B7/04B08B9/08C23C16/30
Owner CENT GLASS CO LTD
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