1results about "Tungsten halides" patented technology

This application provides a method for preparing metal chlorides. This method and apparatus solve the problem of inaccurate flow metering of chlorides as reactants in existing chemical vapor deposition (CVD) processes. The method includes: installing a dedicated chlorine flow meter at the inlet of a chlorine gas inlet pipe; adding bulk metal to a reaction vessel and sealing the vessel; purging the reaction vessel containing the bulk metal with an inert protective gas, heating to remove water and oxygen; heating to a specified temperature, shutting off the inert protective gas, and starting the chlorine gas reaction. This invention precisely controls the flow rate of the chlorine gas to generate a fixed amount of metal chloride. Under the action of a reducing gas, a uniformly deposited, high-strength metal / carbide coating is obtained on the substrate surface. This coating is virtually free of impurities, and the deposited substrate can be used in industries such as semiconductors and medicine. This method is low-cost, produces stable products, and is easy to scale up.