Method and apparatus for the production of high purity tungsten hexafluoride

A technology of tungsten hexafluoride and fluorinating agent, applied in chemical instruments and methods, tungsten halide, carbon compounds, etc., can solve problems such as inability to purify

Inactive Publication Date: 2010-09-08
LINDE NORTH AMERICA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, none of these prior art techniques can purify WF 6

Method used

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  • Method and apparatus for the production of high purity tungsten hexafluoride
  • Method and apparatus for the production of high purity tungsten hexafluoride
  • Method and apparatus for the production of high purity tungsten hexafluoride

Examples

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Embodiment 1

[0043] This example illustrates the use of carbonaceous materials in accordance with the present invention to form WF that is substantially free of elemental fluorine. 6 The stream removes less volatile transition metal species. Tungsten hexafluoride feedstock purified using conventional distillation processes is purchased and supplied in drums. The average molybdenum impurity level was 60 ppb (parts per billion) by weight, significantly greater than the 25 ppb molybdenum impurity specification required by the electronics industry. Similarly, the average chromium impurity level was 41 ppb, significantly greater than the 10 ppb chromium impurity specification required by the electronics industry. Unsuccessful attempts to reduce the levels of these transition metal impurities using standard distillation techniques also significantly reduced the WF 6Yield. Carbonaceous materials are produced according to the present invention, that is, by purchasing commercially available shap...

Embodiment 2

[0046] This example illustrates the use of carbonaceous materials according to the invention from nitrogen-diluted WF 6 Highly volatile components are removed from streams that have a potential high F of 25kPa 2 Partial pressure. Carbonaceous materials with high fluorine content are suitable for potential high fluorine partial pressure, so choose high fluorine content CF x Powder (Carbofluor from Advance Research Chemical (ARC) TM CF x , where the value of x is about 1.15) as the initial carbonaceous material. For 43% by weight of the adsorbent carbonaceous material (ARC Carbofluor TM 2065 grade powder), 5% by weight of fluorine-resistant binder (Dyneon TFTM 2071 polytetrafluoroethylene (PTFE) powder), and 52% by weight of solvent (3M Fluorinert TM FC-84 solvent) for blending, the use of solvent can prevent the binder from clogging CF x porosity. The blended mixture was extruded using an Amandus Kahl laboratory L175 pelletizer equipped with a 3mm die and the resultin...

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Abstract

The present Invention provides new and useful apparatus and methods for purifying WF6 gas, and In particular, provides apparatus and methods of using carbonaceous materials to produce high purity WF6by removing substantially all the high volatility gas impurities and troublesome transition metal impurities The present invention is particularly useful for removing chromium and molybdenum impurities from WF6 gas.

Description

field of invention [0001] The invention relates to a method for producing high-purity tungsten hexafluoride (WF 6 ), and more specifically related to the use of carbonaceous materials from WF 6 Remove impurities. The invention also relates to the use for WF 6 Activated carbonaceous materials in purification and methods of making activated carbonaceous materials. technical background [0002] Tungsten hexafluoride (WF 6 ) are suitable reagents for the production of very large scale integration (VLSI) semiconductor devices, especially dynamic random access memory (DRAM) and high performance microprocessors. WF 6 Usually used in chemical vapor deposition (CVD) and atomic layer deposition (ALD) unit operations to produce tungsten contact plugs and tungsten silicide electrodes. In addition, WF 6 Reacts with aluminum and is used in the production of aluminum trifluoride terminal blocks for semiconductor circuits. WF for these purposes 6 The gas must be very pure and free o...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01G41/04C01B32/336
CPCC01G41/04C01P2006/80
Inventor R·A·霍格尔C·马D·普雷科特W·H·惠斯洛克D·P·小撒切尔
Owner LINDE NORTH AMERICA
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