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Tungsten hexafluoride purifying device prepared from bismuth doped low-temperature-resistant material

A technology of tungsten hexafluoride and purification equipment, which is applied in the direction of tungsten halide, etc., can solve problems such as easy cracking, and achieve the effect of good low temperature resistance mechanical properties and good thermal expansion coefficient

Inactive Publication Date: 2018-10-16
宁波高新区诠宝绶新材料科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] Tungsten hexafluoride is the only tungsten fluoride that can exist stably. It is a widely used gas. It is mainly used in the electronics industry as a raw material for the metal tungsten chemical vapor deposition (CVD) process; , the production and sales of tungsten hexafluoride are on the rise, but there are still relatively few enterprises producing high-purity tungsten hexafluoride in China, and the research on its preparation process is of great significance
[0006] Currently WF 6 The gas purification method mainly adopts the method of combining cryogenic, distillation and adsorption. This method requires the use of a cryogenic device, and its temperature is generally controlled at minus 160-180°C to have a better effect of removing fluorine gas. However, the currently used The material is prone to cracking under this condition for a long time

Method used

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Effect test

Embodiment 1

[0019] A tungsten hexafluoride purification device using bismuth-doped low-temperature-resistant materials, the main components of which are composed of sodium fluoride adsorption tower, light component removal system, fluorine gas cryogenic tank, refrigeration system, vacuum system and packed rectification tower Composition; the sodium fluoride adsorption tower is filled with sodium fluoride particles, and the temperature is controlled at 100°C during the operation period; the light component removal system is installed behind the sodium fluoride adsorption tower, and nitrogen gas is included during the operation period Heating system, cooling system and vacuum system; the fluorine gas cryogenic tank is installed behind the light component removal system, and the temperature is controlled at minus 170°C during the operation period; the packed rectification tower is composed of heating tiles, raw materials bottle, rectifying kettle, mass flow meter and collection tank; it is ch...

Embodiment 2

[0028] A tungsten hexafluoride purification device using bismuth-doped low-temperature-resistant materials, the main components of which are composed of sodium fluoride adsorption tower, light component removal system, fluorine gas cryogenic tank, refrigeration system, vacuum system and packed rectification tower Composition; the sodium fluoride adsorption tower is filled with sodium fluoride particles, and the temperature is controlled at 80°C during the operation period; the light component removal system is installed behind the sodium fluoride adsorption tower, and nitrogen gas is included during the operation period Heating system, cooling system and vacuum system; the fluorine gas cryogenic tank is installed behind the light component removal system, and the temperature is controlled at minus 160°C during the operation period; the packed rectification tower is composed of heating tiles, raw materials bottle, rectifying kettle, mass flow meter and collection tank; it is cha...

Embodiment 3

[0037] A tungsten hexafluoride purification device using bismuth-doped low-temperature resistant materials, the main components of which are a sodium fluoride adsorption tower, a light component removal system, a fluorine gas cryogenic tank, a refrigeration system, a vacuum system and a packed distillation column composition; the sodium fluoride adsorption tower is filled with sodium fluoride particles, and the temperature is controlled at 120 ° C during the operation period; the light component removal system is installed behind the sodium fluoride adsorption tower, and nitrogen is included in the period. Heating system, cooling system and vacuum system; the fluorine gas cryogenic tank is installed behind the light component removal system, and the temperature is controlled at minus 180°C during the operation period; the packed rectification tower is composed of heating tiles, raw materials It consists of a bottle, a rectifying kettle, a mass flow meter and a collecting tank; ...

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Abstract

The invention relates to a tungsten hexafluoride purifying device prepared from a bismuth doped low-temperature-resistant material. According to the tungsten hexafluoride purifying device prepared from the bismuth doped low-temperature-resistant material, hydrogen fluoride gas is removed effectively by sodium fluoride adsorption and deep freeze separation, then by combination with a series of purification means such as vacuum removal of light-components, rectification and the like, a large amount of volatile foreign gas and a large quantity of non-volatile metal impurities can be removed, anda tungsten hexafluoride product with purity being 99.999% or higher is produced; by means of the bismuth doped low-temperature-resistant material, the device has good low-temperature-resistant mechanical properties and coefficient of thermal expansion and can work for a long time under repeated ultralow-temperature conditions.

Description

technical field [0001] The invention belongs to the technical field of equipment preparation; in particular, it relates to a tungsten hexafluoride purification device using bismuth-doped low-temperature-resistant materials. Background technique [0002] Tungsten hexafluoride is the only tungsten fluoride that can exist stably. It is a widely used gas. It is mainly used in the electronics industry as a raw material for the metal tungsten chemical vapor deposition (CVD) process; , the production and sales of tungsten hexafluoride are on the rise, but there are still relatively few enterprises producing high-purity tungsten hexafluoride in China, and the research on its preparation process is of great significance. [0003] CN101070190A discloses a method for purifying tungsten hexafluoride gas. First, the impure tungsten hexafluoride gas in the crude product storage tank is passed into the bottom of an adsorption tower filled with porous spherical sodium fluoride or potassium ...

Claims

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Application Information

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IPC IPC(8): C01G41/04
CPCC01G41/04C01P2006/80
Inventor 王琪宇王新
Owner 宁波高新区诠宝绶新材料科技有限公司
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