Purification method of tungsten hexafluoride gas

A technology of tungsten hexafluoride and purification method, which is applied in the direction of tungsten halide, etc., can solve the problems of low purity of tungsten hexafluoride and non-conformity with electronic grade products, so as to improve product quality and recovery rate, wide range of raw material adaptability, and The effect of less control parameters

Active Publication Date: 2015-10-14
XIAMEN TUNGSTEN
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AI Technical Summary

Problems solved by technology

The purity of industrially synthesized tungsten hexafluoride is relatively low, which does not meet the requirements

Method used

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  • Purification method of tungsten hexafluoride gas

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Embodiment Construction

[0026] The following embodiments will further illustrate the present invention in conjunction with the accompanying drawings.

[0027] see figure 1 Firstly, acetone is used to degrease the hydrogen fluoride removal tower 5, the rectifying still 6, the rectifying tower 15, the front collecting tank 8, the finished product collecting tank 9 and the pipelines connected thereto, then clean and dry with ultrapure water, and Install according to the process. Then open the valves V14, V15, V2, V3, V4, V5, V6, V9, V10, V11, V12, V16, V17, fill the pipeline with nitrogen to 0.06MPa, and check each interface with leak detection fluid or soap bubbles. Leak detection until no bubbles appear is qualified. After the leak detection is qualified, add nitrogen pressure to 0.6MPa, close valves V14 and V15, and then keep the pressure for 24 hours. If the pressure drop of the entire purification system is less than 0.01MPa, it is qualified. If the pressure drop is greater than 0.01MPa , it is n...

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Abstract

A purification method of a tungsten hexafluoride gas relates to a fluoride of tungsten. The purification method comprises the following steps: removing oil by equipment, pressurizing with nitrogen, vacuumizing to the limit, turning on a nitrogen heater, introducing the heated nitrogen into a system, and vacuumizing to the limit; filling a hydrogen fluoride removal tower with nitrogen, putting tungsten hexachloride into the hydrogen fluoride removal tower, introducing high-purity tungsten hexafluoride into a finished product gathering tank, reacting with steam adhered to the wall of the tank to generate hydrogen fluoride, sucking-back impure tungsten hexafluoride in the finished product gathering tank into a rectifying still for low-temperature curing after displacement, detecting content of foreign gas, and stopping high-purity tungsten hexafluoride displacement after qualified; heating primary tungsten hexafluoride and carrying out low-temperature curing, vacuumizing the rectifying still, adsorbing tail gas by a basic spray tower, thawing by hot water, and detecting when pressure is stable and rectifying; carrying out reflux condensation on evaporated tungsten hexafluoride gas in the rectifying tower, removing impurities, rectifying primary tungsten hexafluoride gas and gathering, detecting, gathering by the finished product gathering tank, taking a liquid sample, and detecting metal impurities in tungsten hexafluoride.

Description

technical field [0001] The invention relates to a tungsten fluoride, in particular to a method for purifying tungsten hexafluoride gas. Background technique [0002] Among tungsten fluorides, tungsten hexafluoride (WF 6 ) is the only species that is stable and industrially produced. Its main use is as a raw material for metal tungsten chemical vapor deposition (CVD) process in the electronics industry, especially WSi made of it 2 It can be used as a wiring material for large scale integration (LSI). The composite coating of tungsten and rhenium is prepared by mixed metal CVD process, which can be used in the manufacture of X-ray emitting electrodes and solar absorbers. In addition, WF 6 In the electronics industry, it is also mainly used as a raw material for semiconductor electrodes and conductive pastes. WF 6 There are also many applications in non-electronic industries, such as tungsten can be used to generate hard tungsten carbide on the surface of steel by CVD tec...

Claims

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Application Information

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IPC IPC(8): C01G41/04
Inventor 陈财华陈志刚冯振雷方兰兰
Owner XIAMEN TUNGSTEN
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