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Application device, application method, and computer storage medium

The technology of a processing device and a processing method, which is applied to the device for applying liquid to the surface, the pretreatment surface, the coating layer, etc., can solve the problems such as the inability to obtain a thin film, and achieve the effect of suppressing dripping

Active Publication Date: 2020-03-17
TOKYO ELECTRON LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in the case of using a stretched film in the production of a polarizing plate and a wavelength plate as in the conventional method, there is a limit to reducing the film thickness of the stretched film itself, and a sufficient film cannot be obtained.

Method used

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  • Application device, application method, and computer storage medium
  • Application device, application method, and computer storage medium
  • Application device, application method, and computer storage medium

Examples

Experimental program
Comparison scheme
Effect test

no. 1 Embodiment approach

[0052] Next, a coating treatment device according to a first embodiment of the present invention will be described. figure 1 It is a plan view showing the schematic structure of the coating processing apparatus 1 of 1st Embodiment. figure 2 and image 3 It is a side view showing the schematic structure of the coating processing apparatus 1 of 1st Embodiment. In addition, in the drawings shown below, in order to clarify the positional relationship, the X-axis direction, the Y-axis direction, and the Z-axis direction orthogonal to each other are defined, and the positive direction of the Z-axis is vertically upward.

[0053] The coating processing apparatus 1 has: a mounting table 10 as a holding portion for holding the glass substrate G; a coating nozzle 20 for discharging the coating liquid to the glass substrate G; and receiving the coating liquid discharged from the end of the coating nozzle 20 The liquid receiving part 30.

[0054] The mounting table 10 adsorbs and hold...

no. 2 Embodiment approach

[0082] Next, a coating treatment device according to a second embodiment of the present invention will be described. Figure 9 and Figure 10 It is a side view showing the schematic structure of the coating processing apparatus 1 of 2nd Embodiment.

[0083] The second embodiment differs from the first embodiment in the structure of the liquid receiving unit of the coating treatment device 1 . That is, in the coating processing apparatus 1 of the second embodiment, the liquid receiving unit 100 is provided instead of the liquid receiving unit 30 of the first embodiment.

[0084] The liquid receiving unit 100 is provided on both sides of the glass substrate G held by the stage 10 on the outside in the X-axis direction. Each liquid receiving unit 100 has: a cap 101 that is a closure that closes the discharge port at the end of the coating nozzle 20 ; and a support frame 102 that is a support structure that supports the cap 101 from below.

[0085] The cover 101 is extended in ...

no. 3 Embodiment approach

[0089] Next, a coating treatment device according to a third embodiment of the present invention will be described. Figure 12 It is an explanatory diagram showing how the application liquid P is received by the liquid receiving part 110 in the third embodiment.

[0090] The third embodiment differs from the first embodiment in the configuration of the liquid receiving unit in the coating treatment device 1 . That is, in the coating processing apparatus 1 of the third embodiment, the liquid receiving unit 110 is provided instead of the liquid receiving unit 30 of the first embodiment.

[0091] The liquid receiving parts 110 are provided on both sides of the glass substrate G held by the stage 10 outside in the X-axis direction. Each liquid receiving unit 110 includes a recovery pan 111 that is a recovery container that recovers coating liquid P discharged from the end of the coating nozzle 20 , and a support frame (not shown) that is a support structure that supports the reco...

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Abstract

This application device applies an application liquid to a substrate, said application liquid containing an optical material. The application device has: a holding section that holds the substrate; anapplication nozzle for discharging the application liquid to the substrate held by the holding section; a moving mechanism that relatively moves the holding section and the application nozzle in theorthogonal directions; and a liquid receiving section, which is provided, in a plan view, on both outer sides of the substrate held by the holding section, and which receives the application liquid discharged from the application nozzle.

Description

technical field [0001] (Cross-reference of related application) [0002] This application claims priority based on Japanese Patent Application No. 2017-145753 filed in Japan on July 27, 2017, and uses the content here. [0003] The present invention relates to a coating processing device for coating a coating liquid containing an optical material on a substrate, a coating processing method using the coating processing device, and a computer storage medium. Background technique [0004] For example, in an organic light emitting diode (OLED: Organic Light Emitting Diode), a circular polarizing plate is used to prevent reflection of external light. The circular polarizing plate is produced by laminating a linear polarizing plate and a wavelength plate (retardation plate) so that their polarization axes cross at 45 degrees. In addition, in a liquid crystal display (LCD: Liquid Crystal Display), in order to control optical rotation and birefringence during display, the above-me...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B05C11/10B05C5/02B05C13/02B05D1/26B05D3/00B05D5/06G02B5/30
CPCB05C11/10B05C5/0254B05C13/025B05D1/26B05D5/06G02B5/30
Inventor 西村德彦
Owner TOKYO ELECTRON LTD
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