The invention provides a method for preparing a
porous tantalum medical
implant material based on an
electron beam selective melting technology. The method comprises the steps that firstly,
software is utilized for reconstructing a two-dimensional medical CT image or MRI data, and a three-dimensional model of the
porous tantalum medical
implant material is obtained after structure optimization andsupporting addition
processing are conducted on a three-dimensional rough model; and secondly, selective melting is conducted on
tantalum powder by adopting
electron beams according to shearing-layerdata of the three-dimensional model of the
porous tantalum medical
implant material, and then the porous
tantalum medical
implant material is obtained. According to the method for preparing the porous
tantalum medical
implant material based on the
electron beam selective melting technology, the tantalum
powder is melted and formed under the vacuum condition, and no additive is contained in the tantalum
powder, so that the oxidation phenomenon after heating of tantalum is avoided,
contamination of
impurity elements such as carbon and
oxygen is reduced, the requirement of the customized poroustantalum medical
implant material is met, and meanwhile biological stability and biological compatibility of the porous tantalum medical implant material are improved. Post-
processing processes such as
sintering and annealing do not need to be conducted on the obtained porous tantalum medical implant material, and the method is convenient and efficient.