The invention discloses a
ceramic substrate dual surface
photolithography structure. The dual surface
photolithography structure comprises a supporting frame, an upper
mask plate is arranged at the upper end of the supporting frame, a lower
mask plate is arranged at the lower end of the supporting frame, two
exposure devices are arranged above the upper
mask plate and below the lower mask plate respectively, a
ceramic substrate supporting rack is arranged between the upper mask plate and the lower mask plate, a
ceramic substrate is arranged on the
ceramic substrate supporting rack, and the center positions of the upper mask plate, the
ceramic substrate and the lower mask plate correspond vertically. According to the
ceramic substrate dual surface
photolithography structure, the
exposure devices are simultaneously arranged above the upper mask plate and below the lower mask plate respectively, and the upper surface and the lower surface of the ceramic substrate are exposed simultaneously through the upper
exposure device and the lower exposure device, so that absolute
inosculation of
metal graph positions on the upper surface and the lower surface of the ceramic substrate is ensured, offset can not happen, therefore, the quality of the ceramic substrate is ensured, the yield of the product is improved, production efficiency can be effectively improved, and production cost of an enterprise can be reduced by the adoption of the mode.