The invention discloses a ceramic substrate dual surface photolithography structure. The dual surface photolithography structure comprises a supporting frame, an upper mask plate is arranged at the upper end of the supporting frame, a lower mask plate is arranged at the lower end of the supporting frame, two exposure devices are arranged above the upper mask plate and below the lower mask plate respectively, a ceramic substrate supporting rack is arranged between the upper mask plate and the lower mask plate, a ceramic substrate is arranged on the ceramic substrate supporting rack, and the center positions of the upper mask plate, the ceramic substrate and the lower mask plate correspond vertically. According to the ceramic substrate dual surface photolithography structure, the exposure devices are simultaneously arranged above the upper mask plate and below the lower mask plate respectively, and the upper surface and the lower surface of the ceramic substrate are exposed simultaneously through the upper exposure device and the lower exposure device, so that absolute inosculation of metal graph positions on the upper surface and the lower surface of the ceramic substrate is ensured, offset can not happen, therefore, the quality of the ceramic substrate is ensured, the yield of the product is improved, production efficiency can be effectively improved, and production cost of an enterprise can be reduced by the adoption of the mode.