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Coating equipment and electrode device and application thereof

A technology of coating equipment and electrode device, which is applied in gaseous chemical plating, metal material coating process, coating and other directions, can solve the problems of inability to perform large-scale coating, small cavity capacity, and complicated working turret design.

Active Publication Date: 2020-03-24
JIANGSU FAVORED NANOTECHNOLOGY CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

From the perspective of equipment structure, the design of the working turret is complicated, and the cavity capacity is small, so it cannot be used for mass coating

Method used

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  • Coating equipment and electrode device and application thereof
  • Coating equipment and electrode device and application thereof
  • Coating equipment and electrode device and application thereof

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Embodiment Construction

[0047] The following description serves to disclose the present invention to enable those skilled in the art to carry out the present invention. The preferred embodiments described below are only examples, and those skilled in the art can devise other obvious variations. The basic principles of the present invention defined in the following description can be applied to other embodiments, variations, improvements, equivalents and other technical solutions without departing from the spirit and scope of the present invention.

[0048] Those skilled in the art should understand that in the disclosure of the present invention, the terms "vertical", "transverse", "upper", "lower", "front", "rear", "left", "right", " The orientation or positional relationship indicated by "vertical", "horizontal", "top", "bottom", "inner", "outer", etc. is based on the orientation or positional relationship shown in the drawings, which are only for the convenience of describing the present invention...

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Abstract

The invention provides a coating equipment and electrode device and application thereof. The coating equipment is used for preparing a film on a substrate surface. The coating equipment includes a cavity, as least a bracket and a power supply unit. The cavity is provided with a chamber. The chamber is suitable to be inlet with a gas raw material used for preparing the film. The bracket is arrangedin the chamber. The bracket is used for supporting the substrate. The cavity body acts as a positive pole. The bracket acts as a cathode. A gas in the chamber is deposited directionally in a direction towards the substrate on the bracket under the voltage, and eventually forms the film on the substrate surface, in order to maximize the number of the substrate arranged on the bracket and meet allthe coating requirements of the substrate.

Description

technical field [0001] The invention relates to the field of film coating, and further relates to DLC film coating equipment and its electrode device and application. Background technique [0002] Plasma chemical vapor deposition technology is a commonly used coating technology at present. Driven by an electric field, the gaseous substance containing the constituent atoms of the coating is chemically reacted by means of plasma, thereby depositing a coating on the surface of the material. Coating can endow materials such as PCB circuit boards, electronic devices, mobile phones, keyboards, computers, etc. with good physical and chemical durability; it can enhance the strength of the material surface and improve the scratch resistance, waterproof, wear resistance and corrosion resistance of the material surface And heat dissipation and other properties, while making the surface of the material have a certain low friction. [0003] With the continuous upgrading of electronic de...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/26C23C16/503
CPCC23C16/26C23C16/503
Inventor 宗坚
Owner JIANGSU FAVORED NANOTECHNOLOGY CO LTD
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