The invention relates to normal-pressure
plasma enhanced
chemical vapor deposition coating equipment which comprises a control mechanism, a feeding atomization mechanism, a heating mechanism, a
plasma gun mechanism and a radio-frequency power source. The inlet end of the gas inlet
pipe is communicated with an external compressed process
gas supply mechanism, the outlet end of the gas inlet
pipe is communicated with an inlet of the heating mechanism, the inlet end of the liquid inlet
pipe is communicated with an
external liquid medicine supply mechanism, the outlet end of the liquid inlet pipe is communicated with the gas inlet pipe, and the pipe
diameter of the gas inlet pipe is larger than that of the liquid inlet pipe. And the
radio frequency power supply is electrically connected with the
plasma gun mechanism. According to the
coating equipment, liquid
medicine can be continuously conveyed without an
injection pump, the structure is simplified, the
coating quality is guaranteed, and meanwhile, the situation that sprayed
plasma flow contains liquid
medicine in a
fog drop state is avoided by atomizing the liquid medicine and arranging a
serpentine channel in the heating mechanism. The invention also relates to a coating method.