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A line width measurement method and a line width measurement machine

A measurement and linewidth technology, applied in measurement devices, nonlinear optics, instruments, etc., can solve the problems that affect the success rate of linewidth measurement, affect the efficiency of product production, and the image exceeds the field of view, saving measurement time. , Improve production capacity and ensure the effect of production efficiency

Active Publication Date: 2021-09-17
SUZHOU JINGLAI OPTO CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, in the process of automatic measurement, due to reasons such as abnormal process printing, abnormal imaging, and changes in the external environment, the measured image may exceed the field of view or be incompletely captured, which affects the success rate of line width measurement and thus affects Product Production Efficiency

Method used

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  • A line width measurement method and a line width measurement machine
  • A line width measurement method and a line width measurement machine
  • A line width measurement method and a line width measurement machine

Examples

Experimental program
Comparison scheme
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Embodiment 1

[0040] figure 1 It is a flow chart of a line width measurement method provided by Embodiment 1 of the present invention. This embodiment is applicable to the situation of measuring line width in the production process of liquid crystal display panels. Width measuring machine to perform, the line width measuring machine can include camera components and controllers. The line width measurement method specifically includes the following steps:

[0041] Step S101, the camera component collects the visual field image of the product to be measured.

[0042] Specifically, the measured product includes a display panel master, and the display panel master includes multiple display panels. Optionally, the display panel is mainly composed of a thin film transistor substrate (Thin Film Transistor Substrate, TFT substrate), a color filter substrate (ColorFilter Substrate, CF substrate), and a liquid crystal layer sandwiched between the two substrates. The control camera component of the...

Embodiment 2

[0054] figure 2 It is a flowchart of a line width measurement method in Embodiment 2 of the present invention. see figure 2 , on the basis of Embodiment 1, before the camera component collects the field of view image of the product to be measured, the embodiment of the present invention also includes: the camera component and the product to be measured are aligned to calculate the deviation of the running point; according to the deviation of the running point, The camera component runs to the preset position. Specifically, the line width measurement method includes the following steps:

[0055] Step S201 , the camera component and the product to be measured are aligned, and the running point deviation is calculated.

[0056] Specifically, the alignment step is a first alignment in the line width measurement method, and the first alignment is a mechanical alignment. One-time alignment can determine the coordinate difference between the coordinate system of the camera comp...

Embodiment 3

[0075] image 3 It is a schematic structural diagram of a line width measuring machine in Embodiment 3 of the present invention, Figure 4 It is a structural schematic diagram of a controller of the third embodiment of the present invention. see image 3 with Figure 4 , the line width measuring machine includes: a camera assembly 10 and a controller 20, wherein the controller 20 can be implemented by hardware and / or software to perform the line width measurement method provided by any embodiment of the present invention . The controller 20 includes: a visual field image acquisition module 21, a first measurement image acquisition module 22, a second measurement image acquisition module 23, an image deviation acquisition module 24, a third measurement image acquisition module 25, and a line width calculation module 26 . Among them, the field of view image acquisition module 21 is used to control the camera assembly to collect the field of view image of the product to be m...

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Abstract

The embodiment of the invention discloses a line width measuring method and a line width measuring machine. The method includes: the camera component collects the field of view image of the product to be measured; intercepts the field of view image to obtain the first measurement image of the product to be measured; performs alignment according to the deviation of the marker in the first measurement image, and intercepts the second measurement image According to the second measurement image and the preset image, the image deviation is calculated; according to the image deviation, the third measurement image is intercepted; wherein, the third measurement image includes the measurement part of the product to be measured; according to the measurement part image, measure and calculate the line width of the measured part. The embodiment of the present invention solves the problem that the line width measurement of the measured product fails during the automatic measurement process of the line width measuring machine, improves the success rate of the line width measurement of the measured product, and ensures that the line width of the measured product fails. Product production efficiency.

Description

technical field [0001] Embodiments of the present invention relate to the technical field of display panels, and in particular to a line width measurement method and a line width measurement machine. Background technique [0002] With the development of liquid crystal display panel technology, liquid crystal panels are widely used in electronic products, and people have higher and higher requirements for product precision. In the liquid crystal display panel production process, the line width has a decisive influence on the performance of the device, so the detection of the line width (Critical Dimension, CD) is related to the quality of the product. [0003] Line width measurement is a measurement method used to detect whether the photolithography and etching meet the design requirements. Currently, the commonly used method is to set the CD test target (Mark) measurement. In the array process, it is necessary to measure the line width after yellowing and etching in the pro...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01B11/02G02F1/13
CPCG01B11/02G02F1/1309
Inventor 徐登基
Owner SUZHOU JINGLAI OPTO CO LTD