Teck LEF file verification method and Teck LEF file verification system
A verification method and document technology, applied in special data processing applications, instruments, electrical digital data processing, etc., can solve problems such as inability to expose loopholes, inability to check TechLEF, and inability to solve TechLEF rules.
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no. 1 example
[0054] The first embodiment of the Tech LEF file verification method for integrated circuit automatic layout and routing software provided by the present invention includes the following steps:
[0055] S1, forming two test layout graphics according to integrated circuit process design rules, one of the two test layout graphics is a correctly designed test layout graphics, and the other is a wrongly designed test layout graphics;
[0056] S2, using the pending Tech LEF file to respectively verify the two test layout graphics;
[0057] S3, if the correct design of the test layout pattern is verified by the Tech LEF file, and the result of the verification of the incorrectly designed test layout pattern by the Tech LEF file is incorrect, then it is judged that the Tech LEF file is correct, otherwise it is judged that the Tech LEF file is wrong.
[0058] The first embodiment of the Tech LEF file verification method of the present invention can improve the accuracy of the technica...
no. 2 example
[0060] Such as figure 2 As shown, the second embodiment of the Tech LEF file verification method for integrated circuit automatic layout and routing software provided by the present invention includes the following steps:
[0061] S1, forming two test layout graphics according to integrated circuit process design rules, one of the two test layout graphics is a correctly designed test layout graphics, and the other is a wrongly designed test layout graphics;
[0062] refer to image 3 As shown, the correct test layout pattern is the correct layout pattern that satisfies the minimum size of the integrated circuit process design rules, such as 50 nanometers;
[0063] The wrong test layout pattern is an error layout pattern smaller than the correct test layout pattern by a minimum grid point, for example, 49 nanometers; the minimum grid point is defined according to the actual production process under the condition of satisfying the integrated circuit process design rules;
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